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Journals
Journal of Electrical Engineering
Volume 63 (2012): Issue 5 (September 2012)
Open Access
Hydrogenated amorphous silicon carbon nitride films prepared by PECVD technology: properties
Jozef Huran
Jozef Huran
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Huran, Jozef
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Albín Valovič
Albín Valovič
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Valovič, Albín
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Michal Kučera
Michal Kučera
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Kučera, Michal
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Angela Kleinová
Angela Kleinová
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Kleinová, Angela
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Eva Kovačcová
Eva Kovačcová
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Kovačcová, Eva
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Pavol Boháček
Pavol Boháček
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Boháček, Pavol
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Mária Sekáčová
Mária Sekáčová
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Sekáčová, Mária
Nov 20, 2012
Journal of Electrical Engineering
Volume 63 (2012): Issue 5 (September 2012)
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Published Online:
Nov 20, 2012
Page range:
333 - 335
DOI:
https://doi.org/10.2478/v10187-012-0049-z
Keywords
hydrogenated amorphous silicon carbon nitride
,
PECVD
This content is open access.
