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Materials Science-Poland
Volume 38 (2020): Issue 1 (March 2020)
Open Access
Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO
3
films
S. Subbarayudu
S. Subbarayudu
,
K. Venkata Subba Reddy
K. Venkata Subba Reddy
and
S. Uthanna
S. Uthanna
| May 08, 2020
Materials Science-Poland
Volume 38 (2020): Issue 1 (March 2020)
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Published Online:
May 08, 2020
Page range:
41 - 47
Received:
Aug 17, 2017
Accepted:
Apr 23, 2019
DOI:
https://doi.org/10.2478/msp-2020-0001
Keywords
MoO thin films
,
RF magnetron sputtering
,
sputtering pressure
,
structural properties
,
optical properties
© 2020 S. Subbarayudu et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
S. Subbarayudu
Department of Physics, S.B.V.R. Degree College
India
K. Venkata Subba Reddy
Department of Physics, S.B.V.R. Degree College
India
S. Uthanna
Department of Physics, Sri Venkateswara University
Tirupati, India