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Journals
Journal of Electrical Engineering
Volume 70 (2019): Issue 7 (December 2019)
Open Access
Thickness and tensile stress determination of black silicon layers by spectral reflectance and Raman scattering
Martin Králik
Martin Králik
,
Stanislav Jurečka
Stanislav Jurečka
and
Emil Pinčík
Emil Pinčík
| Sep 28, 2019
Journal of Electrical Engineering
Volume 70 (2019): Issue 7 (December 2019)
Special Issue
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Published Online:
Sep 28, 2019
Page range:
51 - 57
Received:
Mar 19, 2019
DOI:
https://doi.org/10.2478/jee-2019-0041
Keywords
Raman scattering
,
porous silicon
,
black silicon
,
spectral reflectance
,
anodic etching
,
electrochemical etching
,
SCOUT
© 2019 Martin Králik et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.