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Isoconductivity method to study adhesion of yeast cells to gold electrode


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Fig.1

Three-electrode cell. WE: working electrode, Re1: reference electrode, CE: counter-electrode.
Three-electrode cell. WE: working electrode, Re1: reference electrode, CE: counter-electrode.

Fig.2

Serial dilution of yeast cell suspension (YCS) and steps to get final suspension of washed yeasts (YW). Sn = supernatants obtained after nth-centrifugation.
Serial dilution of yeast cell suspension (YCS) and steps to get final suspension of washed yeasts (YW). Sn = supernatants obtained after nth-centrifugation.

Fig.3

Argand diagram of the EEI for gold electrodes polished at 1 μm. Z′ and Z″ are the real and imaginary parts of the impedance. AC overpotential = 10 mV, DC overpotential = 0 V. Error bars for the two axes are symmetric and are represented by a box.
Argand diagram of the EEI for gold electrodes polished at 1 μm. Z′ and Z″ are the real and imaginary parts of the impedance. AC overpotential = 10 mV, DC overpotential = 0 V. Error bars for the two axes are symmetric and are represented by a box.

Fig.4

Temporal evolution of Cp% for 109,108 and 107CFU/ml. Red arrows indicate the time in which the frequency sweeps were performed. The black arrow indicates the time at which the aggregates of supernatant or YW were made. Overpotential applied: 10 mV at 20 Hz.
Temporal evolution of Cp% for 109,108 and 107CFU/ml. Red arrows indicate the time in which the frequency sweeps were performed. The black arrow indicates the time at which the aggregates of supernatant or YW were made. Overpotential applied: 10 mV at 20 Hz.

Fig.5

Dependence of Cp% with the supernatant conductivity.
Dependence of Cp% with the supernatant conductivity.

Fig.6

Dependence of Cp% with the yeast cells concentration.
Dependence of Cp% with the yeast cells concentration.

Fig.7

Images of the electrode surface in three different situations: (a) naked electrode, (b) after a measurement in which supernatant S1 was added and (c) after a measurement in which YW was added.
Images of the electrode surface in three different situations: (a) naked electrode, (b) after a measurement in which supernatant S1 was added and (c) after a measurement in which YW was added.

Fig.8

Explanatory model of the decrease in Cdl due to the attachment of yeast.
Explanatory model of the decrease in Cdl due to the attachment of yeast.

Fitted values of Rct before and after addition of different media and paired samples tests.

CFU/mlMediaRctba/kΩRcta /kΩΔRct/kΩtSig. 2-tailed
MeanSTDV
109S140.9540.34.61.961.10.39
S239.8840.68-.80.44-3.15.09
S340.0540.48-.421.44-.51.66
S440.2640.37-.12.95-.22.85
S540.9640.75.21.241.51.27
YW40.2240.94-.721.12-1.11.38
108S140,4440,53-.091.26-.12.92
S241.0740.40.671.001.16.37
S340.9340.75.181.03.30.80
S440.4439.98.46.551.46.28
YW40.1740.36-.341.10-.53.65
107S140.6540.48.171.07.27.81
S240.1741.00-.82.28-5.07.08
YW40.1740.36-.19.20-1.64.24

Measured conductivities and maximum values of Cp% observed for media used.

CFU/mlMediaσ/(mS cm-1)Cp%
109Sl7.72+0.04-15.0+0.2
S26.76+0.04-10.6+0.2
S35.77+0.04-5.2+0.2
S45.56+0.04-1.8+0.2
S55.49+0.040.0+0.2
YW5.47+0.04-10.0+0.2
108Sl6,08+0.04-7,3+0.2
S25.66+0.04-3.9±O.2
S35.53+0.04-1.2+0.2
S45.48+0.040.0+0.2
YW5.47+0.04-4.2+0.2
107Sl5.62+0.04-3.3+0.2
S25.47+0.040.1+0.2
YW5.47+0.04-2.0+0.2

Steps for polishing electrodes.

StepAbrasiveFinal roughness / μm
1Diamond pasta Praxis®6
2Diamond pasta Praxis®3
3Alumina powder1