Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Data publikacji: 22 lip 2014

Zakres stron: 171 - 175

DOI: https://doi.org/10.2478/s13536-013-0169-6

Słowa kluczowe

plasma surface engineering, magnetron sputtering, aluminum nitride deposition

© 2013 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.