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Structural, morphological, and optical properties of AgxO thin films deposited via obliquely angle deposition

H. Ben Soltane
H. Ben Soltane
, 
F. Chaffar Akkari
F. Chaffar Akkari
, 
B. Gallas
B. Gallas
 oraz 
M. Kanzari
M. Kanzari
   | 12 cze 2023
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Data publikacji: 12 cze 2023
Zakres stron: 27 - 41
Otrzymano: 17 paź 2022
Przyjęty: 31 sty 2023
DOI: https://doi.org/10.2478/msp-2023-0002
Słowa kluczowe
© 2023 H. Ben Soltane et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Fig. 1.

(A) The schematic diagram of the GLAD technique, and (B) diagram of the self-shadowing effect during the growth of the layer. GLAD, glancing angle deposition
(A) The schematic diagram of the GLAD technique, and (B) diagram of the self-shadowing effect during the growth of the layer. GLAD, glancing angle deposition

Fig. 2.

(A) XRD patterns of AgxO thin films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85°annealed at 300°C, and (B) XRD patterns of AgxO thin films in the Bragg angles range 35°–40°. XRD, X-ray diffraction
(A) XRD patterns of AgxO thin films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85°annealed at 300°C, and (B) XRD patterns of AgxO thin films in the Bragg angles range 35°–40°. XRD, X-ray diffraction

Fig. 3.

(A) XRD patterns of AgxO thin films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85°annealed at 400°C, and (B) XRD patterns of AgxO thin films in the Bragg angles range 35°–40°. XRD, X-ray diffraction
(A) XRD patterns of AgxO thin films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85°annealed at 400°C, and (B) XRD patterns of AgxO thin films in the Bragg angles range 35°–40°. XRD, X-ray diffraction

Fig. 4.

Surface morphology of silver thin film before annealing for the incident angle γ=0°
Surface morphology of silver thin film before annealing for the incident angle γ=0°

Fig. 5.

Surface morphologies of silver oxide thin films after annealing at 300°C for the incident angles a=(γ=0°), b= (γ=40°), c=(γ=60°), d=(γ=75°), and e=(γ=85°)
Surface morphologies of silver oxide thin films after annealing at 300°C for the incident angles a=(γ=0°), b= (γ=40°), c=(γ=60°), d=(γ=75°), and e=(γ=85°)

Fig. 6.

Surface morphologies of silver oxide thin films after annealing at 400°C for the incident angles a=(γ=0°), b= (γ=40°), c=(γ=60°), d=(γ=75°), and e=(γ=85°)
Surface morphologies of silver oxide thin films after annealing at 400°C for the incident angles a=(γ=0°), b= (γ=40°), c=(γ=60°), d=(γ=75°), and e=(γ=85°)

Fig. 7.

Cross-section of AgxO thin films deposited at incident angles(A)γ= 60°, (B)γ=75°, and (C)γ=85°
Cross-section of AgxO thin films deposited at incident angles(A)γ= 60°, (B)γ=75°, and (C)γ=85°

Fig. 8.

(A) Transmittance spectra and (B) reflectance spectra of AgxO films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85° for the annealing temperature in free air of 300°C, for silver thin films
(A) Transmittance spectra and (B) reflectance spectra of AgxO films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85° for the annealing temperature in free air of 300°C, for silver thin films

Fig. 9.

(A) Transmittance spectra and (B) reflectance spectra of AgxO films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85° for the annealing temperature in free air of 400°C, for silver thin films
(A) Transmittance spectra and (B) reflectance spectra of AgxO films deposited, respectively, at γ=0°, 20°, 40°, 60°, 75°, and 85° for the annealing temperature in free air of 400°C, for silver thin films

Fig. 10.

Plot of average reflection for AgxO thin films deposited at different deposition angles (γ=0°, 20°, 40°, 60°, 75°, and 85°) annealed at 300°C and 400°C
Plot of average reflection for AgxO thin films deposited at different deposition angles (γ=0°, 20°, 40°, 60°, 75°, and 85°) annealed at 300°C and 400°C

Fig. 11.

The variation of the thickness for the incident angles γ= 40°, 60°, 75°, and 85°for the annealing temperatures (A) 300°C and (B) 400°C
The variation of the thickness for the incident angles γ= 40°, 60°, 75°, and 85°for the annealing temperatures (A) 300°C and (B) 400°C

Fig. 12.

Extinction coefficient spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C
Extinction coefficient spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 13.

Refractive index spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C
Refractive index spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 14.

Δn spectra of films deposited at incident angles γ=40 , 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C
Δn spectra of films deposited at incident angles γ=40 , 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 15.

The variation of the plane birefringence Δn for AgxO thin films deposited at different deposition angles (γ=0°, 20°, 40°, 60°, 75°, and 85°) for the annealing temperature in free air 300°C, for silver thin films
The variation of the plane birefringence Δn for AgxO thin films deposited at different deposition angles (γ=0°, 20°, 40°, 60°, 75°, and 85°) for the annealing temperature in free air 300°C, for silver thin films

Fig. 16.

Absorption coefficient spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C
Absorption coefficient spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Fig. 17.

Direct band gap energy spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C
Direct band gap energy spectra of films deposited at incident angles γ=40°, 60°, 75°, and 85°annealed in free air at (A) 300°C and (B) 400°C

Different phases, Bragg angles, and reticular planes (hkl) of the samples for the incident angles γ=0°, 20°, 40°, 60°, 75°, and 85°and the incident angles γ=0°, 20°, 40°, and 60° for the annealing temperatures 300°C and 400°C, respectively

Annealing temperature (°C) Deposition angle γ (°) Bragg angle 2θ(°) Phases (hkl)
300 00 38.1 Ag (111)
20 44.3 Ag (200)
40 38.1 Ag (111)
60 38.2 Ag2O (200)
75 44.3 Ag (200)
85 32.2 Ag2O (111)
38.1 Ag (111)
38.2 Ag2O (200)
44.3 Ag (200)
32.2 Ag2O (111)
38.1 Ag (111)
38.2 Ag2O (200)
44.3 Ag (200)
32.2 Ag2O (111)
38.2 Ag2O (200)
44.4 Ag (200)
32.2 Ag2O (111)
38.2 Ag2O (200)
400 00 38.1 Ag (111)
20 44.4 Ag (200)
40 38.1 Ag (111)
60 38.2 Ag2O (200)
44.3 Ag (200)
38.1 Ag (111)
38.2 Ag2O (200)
44.3 Ag (200)
38.1 Ag (111)
38.2 Ag2O (200)
44.3 Ag (200)

Structural data of nanocolumnar silver oxide thin films for the incident angles γ=0°, 20°, 40°, 60°, 75°, and 85°, and with the annealing temperature at 300°C and 400°C

Annealing temperature (°C) Deposition angleγ(°) Crystallite size (nm) Strain ε (×10−3) Dislocation density (δ)(×10−3) (nm−2)
300 00 36 2.95 0.77
20 55 1.92 0.33
40 51 2.09 0.38
60 54 1.95 0.34
75 26 3.97 1.47
85 27 3.90 1.37
400 00 37 2.81 0.73
20 57 1.96 0.30
40 51 2.09 0.38
60 55 1.97 0.32
75 – – –
85 – – –
eISSN:
2083-134X
Język:
Angielski
Częstotliwość wydawania:
4 razy w roku
Dziedziny czasopisma:
Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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