Otwarty dostęp

Reduction of defects in the lapping process of the silicon wafer manufacturing: the Six Sigma application


Zacytuj

Fig. 1

Sigma levels depending on DPMO
Sigma levels depending on DPMO

Fig. 2

Y = f (x) cascade
Y = f (x) cascade

Fig. 3

Process capability of TTV for Tight and Loose Spec Material
Process capability of TTV for Tight and Loose Spec Material

Fig. 4

Multi-Vari charts for Avg and Std Dev TTV by LSM reject — Run order
Multi-Vari charts for Avg and Std Dev TTV by LSM reject — Run order

Fig. 5

CNX Diagram for DOE
CNX Diagram for DOE

Fig. 6

Main effect plots for means
Main effect plots for means

Fig. 7

Normal and standardised effects for Pareto charts
Normal and standardised effects for Pareto charts

Fig. 8

Main effects and interaction plots for avg TTV
Main effects and interaction plots for avg TTV

Fig. 9

Response optimiser result
Response optimiser result

Fig. 10

Graphical Summary of Confirmation Test Run Results
Graphical Summary of Confirmation Test Run Results

Fig. 11

Boxplot of TTV for tight flatness spec by improvement stages
Boxplot of TTV for tight flatness spec by improvement stages

Fig. 12

Process capability of TTV for tight and loose spec after improvement
Process capability of TTV for tight and loose spec after improvement

Overview of key quality management concepts

ConceptOriginAimFocusMethodology and ToolsCriticisms
Total Productive MaintenanceJapan (the 1950s)Increase process capability by reduction of unplanned failures, accidents and defectsPreventive and predictive maintenance of processesGap analysis of historical records, cause‐effect analysisSkilled workers required to implement, resource demanding and long‐term
Total Quality ControlJapan (the 1960s)To coordinate quality maintenance and improvement from all groups to achieve the most economical processTo reduce rework and achieve maximum customer satisfactionMethodology: Plan Do Study Act Tools: Statistical techniquesVague and difficult to coordinate
Total Quality Management (TQM)Japan (the 1990s)Improve the quality and consistency of processesCustomer satisfactionMethodology: Plan Do Study Act Tools: Statistical techniquesVague and inconsistent conceptualisation, excessive resource consumption, unsatisfactory resu lts
Zero DefectsDenver Division of the Martin Marietta Corporation (the 1960s)To enhance the quality of a process outcome through the elimination of any defects in the production processDefect eliminationExtra attention and care devoted to each step of the production process ensuring no mistakesExpensive
Reliability engineeringShewart during the 1920s and the 1930s: cited in Kapur and Lamberson (1977)To reduce failure modesLongevity and dependability of parts, products and systemsReliability‐Centred Maintenance, failure modes and effects, root cause analysis, condition‐ based maintenanceTechnical and requires skilled staff. Expensive and demands long term commitment

Critical to Quality metrics of the lapping process

TypENameVOCCTQ
ExternalPolishingNo sharp roll‐off at the edge of waferFor Loose Spec TTV < 3.5 μm
For Tight Spec TTV < 2.0 μm
InternalLappingComparable yield to old active agentTTV reject < 0.10 %
Good FlatnessFor Tight Spec TTV < 2.0 μm

Displaying the impact of improvements on TTV rejects

Before ImprovementAfter Improvement
ParametersTight Flatness SpecLoose Flatness SpecCombinedTight Flatness SpecLoose Combined Flatness Spec
Wafer Qty5,62328,12033,74319,67750,666 70,343
TTV Reject %9.823.354.430.020.01 0.01
DPMO98,16833,49944,282152118 127
Process Capability (Ppk)0.210.52‐NA‐3.871.30 ‐NA‐

Four key stages of silicon wafer manufacturing process

Process FlowDescriptionProcess ObjectiveProcess Demerits
Slicing Silicon ingot is mounted on the slicing machine. A web of meatl wire along with cutting slurry passes through the ingot slowly to provide disc shaped silicon wafersTo generate wafer slice structure. To achieve correct wafer thickness, orientation and warpPoor flatness High surface damage High contamination
Lapping Sliced wafers held in carriers are placed in between two metal plates along with abrasive slurry falling on wafers. Rotation of plates and carriers causes mechnical removal of slicon therby reducing waferReduce slicing damage. Establish optimum wafer flatnessSusceptible to surface and flatness rejects
Chemical Etching Lapped wafers are subjeted to abrasive chemicals which disolves silicon into chemical thereby thinning wafersReduce Previous Process Damage Reduce surface contaminationDegrades flatness wafer staining
Polishing Etched wafers are mounted on plates. With pressure applied on these plates, the wafers are rubbed against fine abrasive polishing pads along with polishing slurry to give a mirror like finishEstablish optimum flatness. Eliminate surface damage. Minimise contamination levelHigh rejection rate Rework cost

Key results from process capability charts

ParametersTight Flatness SpecLoose Flatness SpecCombined
Wafer Qty5,62328,12033,743
TTV Reject %9.823.354.43
DPMO98,168 19,67733,49944,282
Process Capability (Ppk)0.210.52‐NA‐

Response Table for Means

LevelSun Gear RatioBottom Plate SpeedExhaust TimerAcceleration TimerPlate Temp.Recycle Slurry StatusActive agent concentrationSlurry Temp.Slurry Mixing Time
11.28931.03381.00531.00921.19970.99401.01200.99571.0062
20.71230.96780.99630.99250.80201.00770.98971.00600.9955
Delta0.57700.06600.00900.01670.39770.01370.02230.01030.0107
Rank139526487

Selected success stories of the Six Sigma implementation in industries

AuthorsName of an organisationBenefits of implementing the Six Sigma technology
Financial sector
Rucker (2000)Citibank groupNumerous benefits have been reported across different organisations of this group. They successfully halved their credit processing time and reduced internal call‐back time by 80% and external by 85%. Reduced the time between a customer first placing an order till the actual service delivery and the credit decision cycle from 3 days to just 1 day. The time taken to process a statement was also decreased from 28 days to 15 days only
JP Morgan Chase (Global Investment Banking)Improved customer experience in using bank's services such as account opening, balance enquiry, making transfers and payments via online or cheque mode; leading to increased customer satisfaction and a reduction in process cycle time by more than 30%
Antony (2006)British Telecom wholesaleFinancial benefits of over $100 million, greater customer satisfaction, error reduction
Roberts (2004)Bank of America24% reduction in customer complaints and a 10.4% increase in customer satisfaction
Sun Trust BanksSignificant improvement in customer satisfaction
Bolt et al. (2000)American ExpressImproved the external vendor related processes and reduced the numbers of non‐received renewal cards
Manufacturing sector
Antony (2006)Motorola (1992 and 1999)1992: Achieved dramatic reduction in the defect levels of their process by about 150 times
1999: Huge financial gains of about $15 billion over 11 years
HoneywellProfit of $1.2 billion
Texas InstrumentsAchieved a financial gain of over $ 600 million
Johnson and JohnsonThe financial gain of about $500 million
Telefonica de Espana (2001)Whooping increase in revenue by about 30 million in the first 10 months and gain in savings too
Dow chemical/rail delivery projectReported substantial savings in capital expenditures: of over $2.4 million
McClusky (2000)AlliedSignal/ Bendix IQ brake padsThe cycle time of their production‐shipment process decreased by 10 months (18 to 8 months)
AlliedSignal/ Laminates plant in South CarolinaReaped a range of benefits: their capacity almost doubled, and punctuality in delivering goods reached 100% threshold level. Their cycle time and inventory had a reduction of 50% each
DuPont/Yerkes plant in New York (2000)Increase in yearly savings of over $25 million
Seagate TechnologyGained financial profits of about £132 million in just 2 years
General ElectricIncrease in yearly financial savings by about $2 billion
Hughes Aircraft's Missiles Systems Group / Wave soldering op.The quality of their yields improved by about 1000% and productivity by 500%
Raytheon/ Aircraft Integration SystemsAchieved a significant reduction (approx. 88%) in the inspection time spent on the depot maintenance process
McClusky (2000)GE/ Railcar leasing businessAchieved a 62% reduction in the time spent at repair stops
Healthcare sector
Benedetto (2003)Radiology film library, Anderson cancer centreService quality improved
Outpatient CT exam lab at the University of TexasPreparation and waiting times for patients reduced from 45 min to 5 min Dramatic increase by 45% in daily numbers of examinations without an increase in workforce/ equipment
Engineering and Construction sector
Byrne(1998)General Electric1997: made a profit of $320 million which was more than double their goal of $150 million, further in 1999, annual savings of 2 billion
Magnusson et al. (2003)Volvo cars (Sweden)Profit of over 55 million euro in the years 2000 and 2002
Anderson et al. (2006)Business Unit of Transmission and Transportation Networks at EricssonSavings of over 200 million euro between the years 1997‐2003

Data collection plan

Item No.WhatWhyWhenHowWhereWho
1Wafer TraceabilityTo with correlate differentpoor TTVEvery LotData applicationcaptureCentral BrowserDatabase‐ Lapping Op
2TTVKPOV, CTQEvery waferLapping upload ADE, DataCentral DatabaseCW Insp. Op
3Slurry Mixing TimeKPIVEvery time fresh slurry preparedMachine Setting (SOP)Slurry SheetLapping Op
4Slurry DensityKPIVEvery slurry time prepared freshManual MeasurementControl ChartsLapping Op
5Machine flowrateKPIVEvery was changedtime loopManual MeasurementControl ChartsLapping Op
6Plate ShapeKPIV shape) (can affect waferEvery Opertion 40 hr Time ofUsing dial gaugePlate Shape SheetLapping Op
7Recycle StatusSlurryTo different evaluate slurryimpact ofEvery 5 minsData application captureBMS DatabasePSE Op
8Active Agent VolumeKPIV (can affect slurry viscosity)Every time fresh slurry preparedMachine Setting (SOP)Slurry SheetLapping Op
9Sun Gear RatioKPIV (can affect wafer rotation)Any by engineertime changedMachine Setting (SOP)QA RecordsEngineer
10Bottom Plate SpeedKPIV (can affect wafer rotation)Any by engineertime changedMachine Setting (SOP)QA RecordsEngineer
11Exhaust TimerKPIV rotation)(can affect waferAny by engineertime changedMachine Setting (SOP)QA RecordsEngineer
12Acceleration TimerKPIV rotation)(can affect waferAny by engineertime changedMachine Setting (SOP)QA RecordsEngineer
13Slurry TemperatureKPIV viscosity)(can affect slurryEvery slurry time preparedfreshMachine Setting (SOP)Slurry SheetLapping Op
14Plate TemperatureKPIV viscosity)(can affect slurryAt the start of shiftDigital thermometerLot SheetProcessingLapping Op