<abstract xmlns="http://www.w3.org/1999/xhtml"><p>The aim of this work was to elaborate two-dimensional behavioral modeling method of thick-film resistors working in low-temperature conditions. The investigated resistors (made from 5 various resistive inks: 10 resistor coupons, each with 36 resistors with various dimensions), were measured automatically in a cryostat system. The low temperature was achieved in a nitrogen-helium continuous-flow cryostat. For nitrogen used as a freezing liquid the minimal temperature possible to achieve was equal to −195.85 °C (77.3 K). Mathematical model in the form of a multiplication of two polynomials was elaborated based on the above mentioned measurements. The first polynomial approximated temperature behavior of the normalized resistance, while the second one described the dependence of resistance on planar resistors dimensions. Special computational procedures for multidimensional approximation purpose were elaborated. It was shown that proper approximation polynomials and sufficiently exact methods of calculations ensure acceptable modeling errors.</p></abstract>

The aim of this work was to elaborate two-dimensional behavioral modeling method of thick-film resistors working in low-temperature conditions. The investigated resistors (made from 5 various resistive inks: 10 resistor coupons, each with 36 resistors with various dimensions), were measured automatically in a cryostat system. The low temperature was achieved in a nitrogen-helium continuous-flow cryostat. For nitrogen used as a freezing liquid the minimal temperature possible to achieve was equal to −195.85 °C (77.3 K). Mathematical model in the form of a multiplication of two polynomials was elaborated based on the above mentioned measurements. The first polynomial approximated temperature behavior of the normalized resistance, while the second one described the dependence of resistance on planar resistors dimensions. Special computational procedures for multidimensional approximation purpose were elaborated. It was shown that proper approximation polynomials and sufficiently exact methods of calculations ensure acceptable modeling errors.

High accuracy computational methods for behavioral modeling of thick-film resistors at cryogenic temperatures

Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Wybrzeże Wyspiańskiego 27, 50-370 Wrocław,

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

The aim of this work was to elaborate two-dimensional behavioral modeling method of thick-film resistors working in low-temperature conditions. The...

High accuracy computational methods for behavioral modeling of thick-film resistors at cryogenic temperatures

Article Category: Research Article

Data publikacji: 27 kwi 2016

Zakres stron: 212 - 225

Otrzymano: 09 mar 2015

Przyjęty: 21 sty 2016

DOI: https://doi.org/10.1515/msp-2016-0031

Słowa kluczowe
thick-film resistors, cryogenic temperature, behavioral modeling

© 2016 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

High accuracy computational methods for behavioral modeling of thick-film resistors at cryogenic temperatures

Article Category: Research Article

Data publikacji: 27 kwi 2016

Zakres stron: 212 - 225

Otrzymano: 09 mar 2015

Przyjęty: 21 sty 2016

DOI: https://doi.org/10.1515/msp-2016-0031

Słowa kluczowethick-film resistors, cryogenic temperature, behavioral modeling

© 2016 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Słowa kluczowe
thick-film resistors, cryogenic temperature, behavioral modeling