On Both Spatial And Velocity Distribution Of Sputtered Particles In Magnetron Discharge
Data publikacji: 05 paź 2015
Zakres stron: 43 - 57
Otrzymano: 28 gru 2011
Przyjęty: 19 sty 2012
DOI: https://doi.org/10.1515/awutp-2015-0007
Słowa kluczowe
© C. Vitelaru et al.
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
The kinetics of the sputtered atoms from the metallic target as well as the time-space distribution of the argon metastable atoms have been investigated for DC and high power pulse magnetron discharge by means of Tunable Diode – Laser Absorption Spectroscopy (TD-LAS) and Tunable Diode – Laser Induced Fluorescence (TD-LIF). The discharge was operated in argon (5-30 mTorr) with two different targets, tungsten and aluminum, for pulses of 1 to 20 μs, at frequencies of 0.2 to 1 kHz. Peak current intensity of ~100 A has been attained at cathode peak voltage of ~1 kV. The mean velocity distribution functions and particle fluxes of the sputtered metal atoms, in parallel and perpendicular direction to the target, have been obtained and compared for DC and pulse mode.