Accesso libero

Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

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Cita

K. Tadaszak
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
K. Nitsch
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
T. Piasecki
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
W. Posadowski
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
eISSN:
2083-124X
ISSN:
2083-1331
Lingua:
Inglese
Frequenza di pubblicazione:
4 volte all'anno
Argomenti della rivista:
Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties