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Computer-simulated degradation of CF3Cl, CF2Cl2, and CFCl3 under electron beam irradiation

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Fig. 1.

Schematic diagram for the degradation of chlorofluoromethanes under electron beam treatment in wet air (N2–O2).
Schematic diagram for the degradation of chlorofluoromethanes under electron beam treatment in wet air (N2–O2).

Fig. 2.

Degradation of 300 ppm CFCl3 under an electron beam in humid air: O2–N2 = 1:4, H2O= 300 ppm.
Degradation of 300 ppm CFCl3 under an electron beam in humid air: O2–N2 = 1:4, H2O= 300 ppm.

Fig. 3.

Degradation of 300 ppm CF2Cl2 under an electron beam in humid air: O2–N2 = 1:4, H2O = 300 ppm.
Degradation of 300 ppm CF2Cl2 under an electron beam in humid air: O2–N2 = 1:4, H2O = 300 ppm.

Fig. 4.

Degradation of 300 ppm CF3Cl under an electron beam in humid air: O2–N2 = 1:4, H2O = 300 ppm.
Degradation of 300 ppm CF3Cl under an electron beam in humid air: O2–N2 = 1:4, H2O = 300 ppm.

Fig. 5.

Effect of pollutant concentration on its removal efficiency in the air under EB irradiation: (a) CFCl3, (b) CF2Cl2, and (c) CF3Cl.
Effect of pollutant concentration on its removal efficiency in the air under EB irradiation: (a) CFCl3, (b) CF2Cl2, and (c) CF3Cl.

Fig. 6.

Effect of increasing humidity (water concentration) on the removal efficiency of 300 ppm CFCl3 under EB in simulated air.
Effect of increasing humidity (water concentration) on the removal efficiency of 300 ppm CFCl3 under EB in simulated air.

Fig. 7.

Effect of water concentration on the removal efficiency of 300 ppm CFxCly in simulated air under EB irradiation: (a) CF2Cl2, (b) CF3Cl.
Effect of water concentration on the removal efficiency of 300 ppm CFxCly in simulated air under EB irradiation: (a) CF2Cl2, (b) CF3Cl.

Fig. 8.

Predicted effect of dose rates on the removal efficiency of 300 ppm CFC at 13 kGy absorbed dose.
Predicted effect of dose rates on the removal efficiency of 300 ppm CFC at 13 kGy absorbed dose.

Fig. 9.

The removal efficiency of 300 ppm CFCl3 (a) and CF2Cl2 (b) decreases progressively with increasing O2 concentration (from 20% to 70%), N2 is the remaining gas.
The removal efficiency of 300 ppm CFCl3 (a) and CF2Cl2 (b) decreases progressively with increasing O2 concentration (from 20% to 70%), N2 is the remaining gas.

Reaction rates at 298 K of different reactive species with selected chlorofluorocarbons and IP (in electronvolts)

Compound ethr ${\rm{e}}_{{\rm{thr}}}^ - $ (cm3·mol–1·s–1) OH (cm3·mol–1·s–1) O(1D) (cm3·mol–1·s–1) IP (eV) References
CFCl3 2.40 × 10–7 4.79 × 10–18 2.00 × 10–10 11.77 ± 0.02 34, 39–41
CF2Cl2 1.90 × 10-9 6.93 × 10–18 1.40 × 10–10 12.05 ± 0.24 29, 34, 41
CF3Cl 4.20 × 10–13 7.01 × 10–18 4.00 × 10–10 12.60 ± 0.20 34
CF4 Not available 2.00 × 10–18 1.40 × 10–16
eISSN:
1508-5791
Lingua:
Inglese
Frequenza di pubblicazione:
4 volte all'anno
Argomenti della rivista:
Chemistry, Nuclear Chemistry, Physics, Astronomy and Astrophysics, other