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ZnO-Thin Film Growth Processes: Correlation Between the Structural Properties of Hydrochloric Acid (HCl) and Water (H2O) Solution Effect Using Innovative Electrostatic Spray Deposition (ESd) Technology

F. I. Abbas

F. I. Abbas

  • Department of Electrical Engineering, Tokyo University of ScienceJapan
  • Department of Theoretical Physics, University of DhakaDhaka, Bangladesh
  • Department of Electrical Engineering, City UniversityBangladesh
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Abbas, F. I.
 et 
M. Sugiyama

M. Sugiyama

  • Department of Electrical Engineering, Tokyo University of ScienceJapan
  • Research Institute, RIST, Tokyo University of ScienceJapan
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Sugiyama, M.
  
27 mai 2025
ZnO-Thin Film Growth Processes: Correlation Between the Structural Properties of Hydrochloric Acid (HCl) and Water (H2O) Solution Effect Using Innovative Electrostatic Spray Deposition (ESd) Technology's Cover Image
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Publié en ligne: 27 mai 2025
Pages: 68 - 76
DOI: https://doi.org/10.2478/lpts-2025-0023
Mots clés
© 2025 F. I. Abbas et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Langue:
Anglais
Périodicité:
6 fois par an
Sujets de la revue:
Physique, Physique technique et appliquée
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