<abstract xmlns="http://www.w3.org/1999/xhtml"><p> An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ= 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.</p></abstract>

An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ= 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.

Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors

Institute of Optoelectronics, Military University of Technology, 2 Kaliskiego Str., 00-908 Warsaw, Poland

Department of Physics Sciences – MIFT, University of Messina, V. le F. S. d’Alcontres 31, 981 66 S. Agata, Messina, Italy

Nukleonika

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the...

Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors

Publié en ligne: 15 juin 2016

Pages: 139 - 143

Reçu: 24 sept. 2015

Accepté: 01 déc. 2015

DOI: https://doi.org/10.1515/nuka-2016-0024

© by Alfio Torrisi

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.