Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge
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24 févr. 2017
À propos de cet article
Publié en ligne: 24 févr. 2017
Pages: 173 - 180
Reçu: 05 juil. 2016
Accepté: 05 janv. 2017
DOI: https://doi.org/10.1515/msp-2017-0022
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© 2017 A. Kavitha, R. Kannan, S. Rajashabala
This article is distributed under the terms of the Creative Commons Attribution Non-Commercial License, which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Kavitha, A.
Department of Physics, University College of Engineering, Anna UniversityDindigul, India
Kannan, R.
Department of Physics, University College of Engineering, Anna UniversityDindigul, India
Rajashabala, S.
School of Physics, Madurai Kamaraj UniversityMadurai, India