<abstract xml:lang="en" xmlns="http://www.w3.org/1999/xhtml">Titanium oxide thin films were deposited at room temperature by reactive magnetron sputtering in a mixture of oxygen and argon on oxidized silicon substrates. The optimal etching characteristics of TiO2 films by reactive ion etching (RIE) and RIE with inductively coupled plasma source (ICP) were investigated. Patterning of TiO2 tip arrays by electron beam lithography and dry etching were developed. Different spot sizes 200 and 500 nm in diameter and with spacing 500 and 1000 nm were investigated with regards to the minimal size and the pyramidal shape. Experimental results have shown that the exposure dose optimization wa a significant parameter for controlling the tip size and its shape. We successfully fabricated the pyramidal TiO2 tip arrays over an 1 × 1 mm2 area. The TiO2 tip array can be expected to have an important application in gas microsensors.</abstract>

Titanium oxide thin films were deposited at room temperature by reactive magnetron sputtering in a mixture of oxygen and argon on oxidized silicon substrates. The optimal etching characteristics of TiO2 films by reactive ion etching (RIE) and RIE with inductively coupled plasma source (ICP) were investigated. Patterning of TiO2 tip arrays by electron beam lithography and dry etching were developed. Different spot sizes 200 and 500 nm in diameter and with spacing 500 and 1000 nm were investigated with regards to the minimal size and the pyramidal shape. Experimental results have shown that the exposure dose optimization wa a significant parameter for controlling the tip size and its shape. We successfully fabricated the pyramidal TiO2 tip arrays over an 1 × 1 mm2 area. The TiO2 tip array can be expected to have an important application in gas microsensors.

Development and Fabrication of TiO2 Tip Arrays for Gas Sensing

Institute of Electronics and Photonics, Slovak University of Technology, Ilkovičova 3, 812 19 Bratislava, Slovakia

Institute of Informatics, Slovak Academy of Sciences, Dubravska cesta 9, 824 39 Bratislava, Slovakia

Institute of Electrical Engineering, Slovak Academy of Sciences, Dubravská cesta 9, 845 07 Bratislava, Slovakia

Institute of Semiconductor and Solid State Physics, Johannes Kepler University, Altenbergerstr. 69, A-4040 Linz, Austria

Journal of Electrical Engineering

Development and Fabrication of TiO Tip Arrays for Gas Sensing

Titanium oxide thin films were deposited at room temperature by reactive magnetron sputtering in a mixture of oxygen and argon on oxidized silicon substrates....

Development and Fabrication of TiO₂ Tip Arrays for Gas Sensing

Publicado en línea: 21 dic 2011

Páginas: 363 - 366

DOI: https://doi.org/10.2478/v10187-011-0058-3

Palabras clave
TiO thin films, dc magnetron sputtering, reactive ion etching, electron beam lithography, tip array

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