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Fig. 1

The characterization is obtained when GNWs are grown at different growth temperatures and growth times. (A) Sheet resistance of the GNWs. (B) Raman spectra of the GNWs. (C) ID/IG ratio (blue curve) and I2D/IG ratio (red curve). (D–G) AFM image of the GNWs. (H) the efficiency distribution of the GNWs/Si solar cells. AFM, atomic force microscope; GNWs, growth graphene nanowalls
The characterization is obtained when GNWs are grown at different growth temperatures and growth times. (A) Sheet resistance of the GNWs. (B) Raman spectra of the GNWs. (C) ID/IG ratio (blue curve) and I2D/IG ratio (red curve). (D–G) AFM image of the GNWs. (H) the efficiency distribution of the GNWs/Si solar cells. AFM, atomic force microscope; GNWs, growth graphene nanowalls

Fig. 2

Comparison of photovoltaic characteristics and performance parameters under different growth temperatures and growth times of direct-grown GNWs on bare silicon. (A) Light J–V characteristics of GNWs/Si solar cells. (B) EQE spectra of GNWs/Si solar cells. (C) The extraction of series resistance by plotting dV/dJ vs. J−1 in forward bias region. (D) The extraction of ideality factor n and reverse saturation current density J0 by plotting log[J + (J–VRS)/RSH] vs. (V-JRS) near forward bias region
Comparison of photovoltaic characteristics and performance parameters under different growth temperatures and growth times of direct-grown GNWs on bare silicon. (A) Light J–V characteristics of GNWs/Si solar cells. (B) EQE spectra of GNWs/Si solar cells. (C) The extraction of series resistance by plotting dV/dJ vs. J−1 in forward bias region. (D) The extraction of ideality factor n and reverse saturation current density J0 by plotting log[J + (J–VRS)/RSH] vs. (V-JRS) near forward bias region

Fig. 3

SEM images of devices. (A) The cross-section of GNWs. (B) The cross-section of GNWs with PEDOT:Nafion coatings. (C) Device schematic to illustrate the structure of directly grown GNWs silicon Schottky junction solar cell after adding PEDOT: Nafion coating. GNWs, growth graphene nanowalls; SEM, scanning electron microscopy
SEM images of devices. (A) The cross-section of GNWs. (B) The cross-section of GNWs with PEDOT:Nafion coatings. (C) Device schematic to illustrate the structure of directly grown GNWs silicon Schottky junction solar cell after adding PEDOT: Nafion coating. GNWs, growth graphene nanowalls; SEM, scanning electron microscopy

Fig. 4

(A) Light J–V characteristics (B) and EQE characterization of solar cells with PEDOT:Nafion coating and pristine GNWs. Dark state measurements of the GNWs/Si solar cells with and without PEDOT:Nafion coatings. (C) The extraction of series resistance by plotting dV/dJ vs. J−1 in forward bias region. (D) The extraction of ideality factor n and reverse saturation current density J0 by plotting log[J + (J–VRS)/RSH] vs. (V–JRS) near forward bias region. EQE, external quantum efficiency; GNWs, growth graphene nanowalls
(A) Light J–V characteristics (B) and EQE characterization of solar cells with PEDOT:Nafion coating and pristine GNWs. Dark state measurements of the GNWs/Si solar cells with and without PEDOT:Nafion coatings. (C) The extraction of series resistance by plotting dV/dJ vs. J−1 in forward bias region. (D) The extraction of ideality factor n and reverse saturation current density J0 by plotting log[J + (J–VRS)/RSH] vs. (V–JRS) near forward bias region. EQE, external quantum efficiency; GNWs, growth graphene nanowalls

Fig. 5

(A) Transmittance and (B) reflection comparison of direct growth of GNWs and GNWs with PEDOT:Nafion coatings. (C) UPS results of GNWs with and without PEDOT:Nafion coatings. GNWs, growth graphene nanowalls; UPS, ultraviolet photoelectron spectroscopy
(A) Transmittance and (B) reflection comparison of direct growth of GNWs and GNWs with PEDOT:Nafion coatings. (C) UPS results of GNWs with and without PEDOT:Nafion coatings. GNWs, growth graphene nanowalls; UPS, ultraviolet photoelectron spectroscopy

Parameters and photovoltaic properties of GNWs/Si solar cells under different growth temperatures and growth times

Temperature (°C) – time (min) Voc (V) Jsc (mA/cm2) FF (%) PCE (%)
580 – 120 0.346 17.51 37.28 2.26
590 – 100 0.391 22.25 41.39 3.6
600 – 80 0.399 23.1 41.52 3.83
610 – 70 0.37 22.1 40.9 3.34

A comparison of the present results with those of previous studies

Device structure Active area (cm2) Sheet resistance (kΩ/sq) Voc (V) Jsc (mA/cm2) FF (%) PCE (%)
Gr-Uncertain silicon surface [15] 0.09 0.9 0.35 28 36 3.5
Gr-micropyramidal silicon [23] - 1.28 0.351 28.7 38 3.8
Gr-polished silicon [17] 0.3 0.8 0.4 21.99 34.79 3.5
Gr-polished silicon [7] 0.3 1.64 0.391 25.17 56.03 5.51
Gr-polished silicon [20] 0.9 3.38 0.395 18.91 42.7 3.19
Present work 0.45 1.3 0.399 23.1 41.52 3.83
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Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties