Multifractal characteristics of titanium nitride thin films

Publicado en línea: 30 ago 2016

Páginas: 541 - 548

DOI: https://doi.org/10.1515/msp-2015-0086

Palabras clave

atomic force microscopy, DC magnetron sputtering, multifractal analysis, surface roughness, titanium nitride (TiN) thin film

© 2016

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.