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Morphology, microstructure and magnetic properties of thermionic vacuum arc deposited NiFeCu ferromagnetic thin films

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22. März 2013

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NiFeCo granular ferromagnetic thin films were deposited on glass and silicon wafer substrates in thermionic vacuum arc plasma with simultaneous ignition of plasma in Cu and NiFe vapors. The structural and morphological properties of the prepared films were investigated by TEM Transmission Electron Microscopy (TEM) and Scanning Electron Microscopy (SEM). Elemental composition of the films was revealed after X-ray energy dispersive spectroscopy analysis (EDAX). The magneto-optical longitudinal Kerr rotation spectra of the samples were also measured and compared.

Sprache:
Englisch
Zeitrahmen der Veröffentlichung:
2 Hefte pro Jahr
Fachgebiete der Zeitschrift:
Chemie, Chemie, andere