<abstract xmlns="http://www.w3.org/1999/xhtml"><p> Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are separate. The analysis of self-traceable Cr atom lithography nano-gratings shows a positive relevance and sensitivity between LER and evaluated standard deviation of pitch. Therefore, LER can be used as an aided pre-evaluation parameter for the pitch calculation method, such as the gravity center method or the zero-crossing points method. The optimization of the nano-grating evaluation method helps to obtain the accurate pitch value with fewer measurements and provide a comprehensive characterization of pitch standards.</p></abstract>

Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are separate. The analysis of self-traceable Cr atom lithography nano-gratings shows a positive relevance and sensitivity between LER and evaluated standard deviation of pitch. Therefore, LER can be used as an aided pre-evaluation parameter for the pitch calculation method, such as the gravity center method or the zero-crossing points method. The optimization of the nano-grating evaluation method helps to obtain the accurate pitch value with fewer measurements and provide a comprehensive characterization of pitch standards.

Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis

Measurement Science Review

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Pitch uncertainty and line edge roughness are among the critical quality attributes of a pitch standard and normally the analyses of these two parameters are...

Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis

Online veröffentlicht: 22. Nov. 2017

Seitenbereich: 264 - 268

Eingereicht: 30. Juli 2017

Akzeptiert: 13. Nov. 2017

DOI: https://doi.org/10.1515/msr-2017-0032

Schlüsselwörter
Pitch evaluation, nano-grating standard, line edge roughness, atomic force microscope

© by Xiao Deng

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Optimization of Nano-Grating Pitch Evaluation Method Based on Line Edge Roughness Analysis

Online veröffentlicht: 22. Nov. 2017

Seitenbereich: 264 - 268

Eingereicht: 30. Juli 2017

Akzeptiert: 13. Nov. 2017

DOI: https://doi.org/10.1515/msr-2017-0032

SchlüsselwörterPitch evaluation, nano-grating standard, line edge roughness, atomic force microscope

© by Xiao Deng

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Schlüsselwörter
Pitch evaluation, nano-grating standard, line edge roughness, atomic force microscope