<abstract xmlns="http://www.w3.org/1999/xhtml"><p> We demonstrate the interferometer-based approach for nanoscale grating Critical Dimension (CD) measurements and prove the possibility to achieve no worse than 10 nm accuracy of measurements for 100 nm pitch gratings. The approach is based on phase shift measurement of light fields specularly reflected from periodical pattern and adjacent substrate with subsequent comparison between experimental and simulation results. RCWA algorithm is used to fit the measured results and extract the CD value. It is shown that accuracy of CD value measurement depends rather on the grating’s CD/pitch ratio than its CD value</p></abstract>

We demonstrate the interferometer-based approach for nanoscale grating Critical Dimension (CD) measurements and prove the possibility to achieve no worse than 10 nm accuracy of measurements for 100 nm pitch gratings. The approach is based on phase shift measurement of light fields specularly reflected from periodical pattern and adjacent substrate with subsequent comparison between experimental and simulation results. RCWA algorithm is used to fit the measured results and extract the CD value. It is shown that accuracy of CD value measurement depends rather on the grating’s CD/pitch ratio than its CD value

Interferometer -based Technology for Optical Nanoscale Inspection

SAIT-Russia Laboratory, Samsung Research Institute Russia, Dvintsev str. No 12, 127018, Moscow, Russia

Measurement Science Review

{"article-title":"Interferometer -based Technology for Optical Nanoscale Inspection"}

We demonstrate the interferometer-based approach for nanoscale grating Critical Dimension (CD) measurements and prove the possibility to achieve no worse than...

Interferometer -based Technology for Optical Nanoscale Inspection

Published Online: Mar 06, 2014

Page range: 25 - 28

DOI: https://doi.org/10.2478/msr-2014-0004

Keywords
Critical dimension, nanoscale inspection, nanoscale measurements, interferometry

This content is open access.

Interferometer -based Technology for Optical Nanoscale Inspection

Published Online: Mar 06, 2014

Page range: 25 - 28

DOI: https://doi.org/10.2478/msr-2014-0004

KeywordsCritical dimension, nanoscale inspection, nanoscale measurements, interferometry

This content is open access.

Keywords
Critical dimension, nanoscale inspection, nanoscale measurements, interferometry