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Effect of evaporation rate and substrate temperature on optical, structural, and electrical properties of ZnTe:Sb films deposited by thermal evaporation of Zn, Te, and Sb sources

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Jun 30, 2025

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Figure 1

XRD patterns of the prepared films.
XRD patterns of the prepared films.

Figure 2

EDX spectra of films Za1 to Za4.
EDX spectra of films Za1 to Za4.

Figure 3

SEM micrographs of films Za4 (with two resolutions), Zb1, and Zb3.
SEM micrographs of films Za4 (with two resolutions), Zb1, and Zb3.

Figure 4

A plot of ln(σ) against 1/kT along with the linear fit of the data.
A plot of ln(σ) against 1/kT along with the linear fit of the data.

Figure 5

A plot of ln(σ) against 1/kT of the films.
A plot of ln(σ) against 1/kT of the films.

Figure 6

A plot of transmittance against wavelength of all deposited films.
A plot of transmittance against wavelength of all deposited films.

Figure 7

Transmittance data along with the fitting curve of Zb4.
Transmittance data along with the fitting curve of Zb4.

Figure 8

A plot of (αhν)2 against photon energy (hν).
A plot of (αhν)2 against photon energy (hν).

EDX and conductivity results_

Film number Zn ratio element % (±2%) Te ratio element % (±2%) Sb ratio element % (±2%) Resistivity at 30°C (Ω-cm) Conductivity activation energy (eV)
Za1 50.44 49.56 8.93 × 106 0.68
Za2 50.33 47.27 2.44 1.62 × 102 0.21
Za3 49.54 44.28 8.18 1.34 × 101 0.09
Za4 49.28 37.76 12.96 3.30 × 10−1 0.06
Zb1 50.14 49.86 6.72 × 107 0.76
Zb2 50.13 49.87 2.71 × 103 0.27
Zb3 50.16 49.84 8.70 × 102 0.21
Zb4 50.10 48.49 1. 41 2.72 × 102 0.18

Results of the calculated optical parameters_

Film number Thickness (nm) Root mean square roughness (nm) n = [ 1 + ( n 0 2 1 ) λ 2 / ( λ 2 λ 0 2 ) ] 1 / 2 n={{[}1+({n}_{0}^{2}-1){\lambda }^{2}/({\lambda }^{2}-{\lambda }_{0}^{2})]}^{1/2} Energy gap (eV)
n o λ o (nm)
Za1 653 ± 3 12.3 ± 0.7 2.72 ± 0.01 292.5 ± 1.1 2.25 ± 0.005
Za2 756 ± 1 09.9 ± 0.5 2.94 ± 0.01 299.7 ± 0.7 2.13 ± 0.005
Za3 876 ± 3 16.0 ± 0.7 2.97 ± 0.01 348 ± 1.5 1.95 ± 0.005
Za4 954 ± 4 18.2 ± 1.0 3.06 ± 0.02 363 ± 2.5 1.80 ± 0.005
Zb1 660 ± 3 12.6 ± 0.7 2.71 ± 0.01 294.8 ± 1.0 2.26 ± 0.005
Zb2 616 ± 2 9.7 ± 0.8 2.72 ± 0.01 298.5 ± 1.0 2.25 ± 0.005
Zb3 601 ± 2 10.3 ± 0.6 2.76 ± 0.01 295.9 ± 0.9 2.22 ± 0.005
Zb4 582 ± 1 10.4 ± 0.5 2.81 ± 0.01 286.7 ± 0.8 2.20 ± 0.005

Deposition parameters_

Film number Substrate temp. (°C) Sb source temp. (°C) Zn source temp. (°C) Te source temp. (°C) Sb evaporation rate (nm/s)
Za1 250 540 480
Za2 250 560 540 480 1.1
Za3 250 600 540 480 2.9
Za4 250 640 540 480 5.2
Zb1 350 540 480
Zb2 350 560 540 480 1.1
Zb3 350 600 540 480 2.9
Zb4 350 640 540 480 5.2