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ZnO-Thin Film Growth Processes: Correlation Between the Structural Properties of Hydrochloric Acid (HCl) and Water (H2O) Solution Effect Using Innovative Electrostatic Spray Deposition (ESd) Technology

F. I. Abbas

F. I. Abbas

  • Department of Electrical Engineering, Tokyo University of ScienceJapan
  • Department of Theoretical Physics, University of DhakaDhaka, Bangladesh
  • Department of Electrical Engineering, City UniversityBangladesh
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Abbas, F. I.
 and 
M. Sugiyama

M. Sugiyama

  • Department of Electrical Engineering, Tokyo University of ScienceJapan
  • Research Institute, RIST, Tokyo University of ScienceJapan
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Sugiyama, M.
  
May 27, 2025
ZnO-Thin Film Growth Processes: Correlation Between the Structural Properties of Hydrochloric Acid (HCl) and Water (H2O) Solution Effect Using Innovative Electrostatic Spray Deposition (ESd) Technology's Cover Image
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Published Online: May 27, 2025
Page range: 68 - 76
DOI: https://doi.org/10.2478/lpts-2025-0023
Keywords
© 2025 F. I. Abbas et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Abbas, F. I.
Department of Electrical Engineering, Tokyo University of ScienceJapan
Department of Theoretical Physics, University of DhakaDhaka, Bangladesh
Department of Electrical Engineering, City UniversityBangladesh
Sugiyama, M.
Department of Electrical Engineering, Tokyo University of ScienceJapan
Research Institute, RIST, Tokyo University of ScienceJapan
Language:
English
Publication timeframe:
6 times per year
Journal Subjects:
Physics, Technical and Applied Physics
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