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Journals
Journal of Electrical Engineering
Volume 64 (2013): Issue 6 (November 2013)
Open Access
The AZ 5214E Resist in EBDW Lithography and its Use as a RIE Etch–Mask in Etching Thin Ag Layers in N
2
Plasma
Robert Andok
Robert Andok
,
Anna Benčurová
Anna Benčurová
,
Pavol Nemec
Pavol Nemec
,
Anna Konečníková
Anna Konečníková
,
Ladislav Matay
Ladislav Matay
,
Jaroslava Škriniarová
Jaroslava Škriniarová
and
Pavol Hrkút
Pavol Hrkút
| Nov 23, 2013
Journal of Electrical Engineering
Volume 64 (2013): Issue 6 (November 2013)
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Published Online:
Nov 23, 2013
Page range:
371 - 375
DOI:
https://doi.org/10.2478/jee-2013-0056
Keywords
AZ 5214E resist
,
PMMA resist
,
image reversal
,
EBDW lithography
,
characteristic curves
,
RIE
,
etch-rates
This content is open access.