[[1] T. Abe,T. Yamashina. The deposition rate of metallic thin films in the reactive sputtering process. Thin Solid Films, 30, 1 (1975) 19–27. ⇒12010.1016/0040-6090(75)90300-4]Search in Google Scholar
[[2] Z. Ahmad, B. Abdallah. Controllability analysis of reactive magnetron sputtering process. Acta Physica Polonica, A., 123, 1 2013. ⇒12710.12693/APhysPolA.123.3]Search in Google Scholar
[[3] S. Berg, H.-O. Blom, T. Larsson, C. Nender. Modeling of reactive sputtering of compound materials. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 5, 2 (1987) 202–207. ⇒120, 12410.1116/1.574104]Search in Google Scholar
[[4] S. Berg, C. Nender. Modeling of mass transport and gas kinetics of the reactive sputtering process. Le Journal de Physique IV, 5 (C5):C5–45, 1995. ⇒120, 12410.1051/jphyscol:1995502]Search in Google Scholar
[[5] S. Berg, T. Nyberg, H.-O. Blom, C. Nender. Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 16, 3 (1998) 1277–1285. ⇒120 122, 123 12410.1116/1.581274]Search in Google Scholar
[[6] S. Berg, T. Nyberg. Fundamental understanding and modeling of reactive sputtering processes. Thin solid films, 476, 2 (2005) 215–230. ⇒11710.1016/j.tsf.2004.10.051]Search in Google Scholar
[[7] M.-M.-M. Bilek, D.-R. McKenzie. Predicting the structure of plasma deposited materials. Czechoslovak Journal of Physics52 (2002) 905–920. ⇒119]Search in Google Scholar
[[8] C.-K. Birdsall, A.-B. Langdon. Plasma Physics Via Computer Simulation, Bristol, UK. IOP Publishing, 1991. ⇒11610.1887/0750301171]Search in Google Scholar
[[9] A. Bogaerts, M. van Straaten, R. Gijbels. Monte Carlo simulation of an analytical glow discharge: motion of electrons, ions and fast neutrals in the cathode dark space. Spectrochimica Acta Part B: Atomic Spectroscopy, 50, 2 (1995) 179–196. ⇒115, 11610.1016/0584-8547(94)00117-E]Search in Google Scholar
[[10] A. Bogaerts, R. Gijbels, W.-J. Goedheer. Hybrid Monte Carlo-fluid model of a direct current glow discharge. Journal of Applied Physics, 78, 4 (1995) 2233–2241. ⇒11610.1063/1.360139]Search in Google Scholar
[[11] A. Bogaerts, M. van Straaten, R. Gijbels. Description of the thermalization process of the sputtered atoms in a glow discharge using a three-dimensional Monte Carlo method. Journal of applied physics, 77, 5 (1995) 1868–1874. ⇒11610.1063/1.358887]Search in Google Scholar
[[12] A. Bogaerts, R. Gijbels, W.-J. Goedheer. Two-dimensional model of a direct current glow discharge: Description of the electrons, argon ions, and fast argon atoms. Analytical Chemistry, 68, 14 (1996) 2296–2303. ⇒11610.1021/ac9510651]Search in Google Scholar
[[13] A. Bogaerts, J. Naylor, M. Hatcher, W.-J. Jones, R. Mason. Influence of sticking coe cients on the behavior of sputtered atoms in an argon glow discharge: Modeling and comparison with experiment. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 16, 4 (1998) 2400–2410. ⇒12310.1116/1.581359]Search in Google Scholar
[[14] J.-W. Bradley. The plasma properties adjacent to the target in a magnetron sputtering source. Plasma sources science and technology, 5, 4 (1996) 622. ⇒11610.1088/0963-0252/5/4/003]Search in Google Scholar
[[15] P. Carlsson, C. Nender, H. Barankova, S. Berg. Reactive sputtering using two reactive gases, experiments and computer modeling. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 11, 4 (1993) 1534–1539. ⇒122, 12510.1116/1.578501]Search in Google Scholar
[[16] J.-M. Chappé, N. Martin, J. Lintymer, F. Sthal, G. Terwagne, J. Takadoum. Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process. Applied Surface Science, 253, 12 (2007) 5312–5316. ⇒128]Search in Google Scholar
[[17] D.-J. Christie, W.-D. Sproul, D. Carter. Mid-frequency dual magnetron reactive co-sputtering for deposition of customized index optical films. In Society of Vacuum Coaters 46 th Annual Technical Conference, 2003 pp. 393–398. ⇒125]Search in Google Scholar
[[18] D.-J. Christie. Power conversion and control for pulsed magnetron reactive sputtering. PhD thesis, Colorado State University, 2004. ⇒125]Search in Google Scholar
[[19] D.-J. Christie. Making magnetron sputtering work: Modelling reactive sputtering dynamics, part 1. SVC Bulletin, 2014. pp. 24–27. ⇒127]Search in Google Scholar
[[20] D.-J. Christie. Making magnetron sputtering work: Modelling reactive sputtering dynamics, part 2. SVC Bulletin, 2015, pp. 30–33. ⇒127]Search in Google Scholar
[[21] D.-J. Christie. Making magnetron sputtering work: Modelling reactive sputtering dynamics, part 3. SVC Bulletin, 2015, pp. 38–41. ⇒127]Search in Google Scholar
[[22] C. Costin, L. Marques, G. Popa, G. Gousset. Two-dimensional fluid approach to the dc magnetron discharge. Plasma Sources Science and Technology, 14, 1 (2005) 168. ⇒116]Search in Google Scholar
[[23] N.-F. Cramer. Analysis of a one-dimensional, steady-state magnetron discharge. Journal of Physics D: Applied Physics, 30, 18 (1997) 2573. ⇒11610.1088/0022-3727/30/18/012]Search in Google Scholar
[[24] D. Depla, J. Haemers, G. Buyle, R. De Gryse. Hysteresis behavior during reactive magnetron sputtering of Al2O3 using a rotating cylindrical magnetron. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 24, 4 (2006) 934–938. ⇒12710.1116/1.2198870]Search in Google Scholar
[[25] D. Depla, S. Heirwegh, S. Mahieu, R. De Gryse. Towards a more complete model for reactive magnetron sputtering. Journal of Physics D: Applied Physics, 40, 7 (2007) 1957. ⇒117]Search in Google Scholar
[[26] D. Depla, S. Mahieu, et al. Reactive Sputter Deposition, volume 109. Springer, 2008. ⇒116, 117, 12110.1007/978-3-540-76664-3]Search in Google Scholar
[[27] D. Depla, X.-Y. Li, S. Mahieu, K.-V. Aeken, W.-P. Leroy, J. Haemers, R. De Gryse, A. Bogaerts. Rotating cylindrical magnetron sputtering: Simulation of the reactive process. Journal of Applied Physics, 107, 11 (2010) 113307. ⇒117, 12710.1063/1.3415550]Search in Google Scholar
[[28] D. Depla, K. Strijckmans, A. Dulmaa, F. Cougnon, R. Dedoncker, R. Schelfhout, I. Schramm, F. Moens, R. De Gryse. Modeling reactive magnetron sputtering: Opportunities and challenges. Thin Solid Films, 2019. ⇒13110.1016/j.tsf.2019.05.045]Search in Google Scholar
[[29] J. Goree, T.-E. Sheridan. Magnetic field dependence of sputtering magnetron efficiency. Applied physics letters, 59, 9 (1991) 1052–1054. ⇒11610.1063/1.106342]Search in Google Scholar
[[30] T. Hammerschmidt, A. Kersch, P. Vogl. Embedded atom simulations of titanium systems with grain boundaries. Physical Review B, 71, 20 (2005) 205409. ⇒11810.1103/PhysRevB.71.205409]Search in Google Scholar
[[31] J. Heller. Reactive sputtering of metals in oxidizing atmospheres. Thin Solid Films, 17, 2 (1973) 163–176. ⇒12010.1016/0040-6090(73)90125-9]Search in Google Scholar
[[32] M.-A. Karolewski. Kalypso: a software package for molecular dynamics simulation of atomic collisions at surfaces. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 230, 1-4 (2005) 402–405. ⇒11710.1016/j.nimb.2004.12.074]Search in Google Scholar
[[33] A. Kelemen, D. Biró, A.-Zs. Fekete, L. Jakab-Farkas, R.-R. Madarász. Macroscopic thin film deposition model for the two-reactive-gas sputtering process. Acta Universitatis Sapientiae Electrical and Mechanical Engineering, 8 (2016) 62–78. ⇒125, 12710.1515/auseme-2017-0005]Search in Google Scholar
[[34] S. Kikkawa, M. Fujiki, M. Takahashi, and F. Kanamaru. Reactive co-sputter deposition and succesive annealing of fe-al-n thin film. Journal of the Japan Society of Powder and Powder Metallurgy, 44, 7 (1997) 674–677. ⇒12510.2497/jjspm.44.674]Search in Google Scholar
[[35] R.-L. Kinder, M.-J. Kushner. Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 19, 1 (2001) 76–86. ⇒11610.1116/1.1329122]Search in Google Scholar
[[36] T. Kubart, O. Kappertz, T. Nyberg, S. Berg. Dynamic behaviour of the reactive sputtering process. Thin Solid Films, 515, 2 (2006) 421–424. ⇒11710.1016/j.tsf.2005.12.250]Search in Google Scholar
[[37] W.-P. Leroy, S. Mahieu, R. Persoons, D. Depla. Method to determine the sticking coe cient of o2 on deposited al during reactive magnetron sputtering, using mass spectrometry. Plasma Processes and Polymers, 51, 6 (2009) S342–S346. ⇒12410.1002/ppap.200932401]Search in Google Scholar
[[38] W.-P. Leroy, S. Mahieu, R. Persoons, D. Depla. Quantification of the incorporation coe cient of a reactive gas on a metallic film during magnetron sputtering: The method and results. Thin Solid Films, 518, 5 (2009) 1527–1531. ⇒12410.1016/j.tsf.2009.07.190]Search in Google Scholar
[[39] W.-P. Leroy, S. Mahieu, D. Depla, A.-P. Ehiasarian. High power impulse magnetron sputtering using a rotating cylindrical magnetron. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 28, 1 (2010) 108–111. ⇒12710.1116/1.3271136]Search in Google Scholar
[[40] R.-R. Madarász and A. Kelemen. Stoichiometry control of the two gas reactive sputtering process. In 2019 IEEE 19th International Symposium on Computational Intelligence and Informatics and 7th IEEE International Conference on Recent Achievements in Mechatronics, Automation, Computer Sciences and Robotics (CINTI-MACRo), pp. 000217–000222. IEEE, 2019. ⇒128, 129, 13010.1109/CINTI-MACRo49179.2019.9105135]Search in Google Scholar
[[41] N. Martin, R. Sanjines, J. Takadoum, F. Lévy. Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique. Surface and Coatings Technology, 142 (2001) 615–620. ⇒12810.1016/S0257-8972(01)01149-5]Search in Google Scholar
[[42] H.-E. McKelvey. Rotatable sputtering apparatus, May 1 1984. US Patent 4,445,997. ⇒127]Search in Google Scholar
[[43] C. Misiano and E. Simonetti. 4.4 co-sputtered optical films. Vacuum, 27, 4 (1977) 403–406. ⇒12510.1016/0042-207X(77)90031-8]Search in Google Scholar
[[44] W. Möller, W. Eckstein, J.-P. Biersack. Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solids. Computer Physics Communications, 51, 3 (1988) 355–368. ⇒11710.1016/0010-4655(88)90148-8]Search in Google Scholar
[[45] W. Möller, M. Posselt. TRIDYN FZR User Manual. FZR Dresden, 2001. ⇒117]Search in Google Scholar
[[46] M. Moradi, C. Nender, S. Berg, H.-O. Blom, A. Belkind, Z. Orban. Modeling of multicomponent reactive sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 9, 3 (1991) 619–624. ⇒12510.1116/1.577376]Search in Google Scholar
[[47] E. Penilla, J. Wang. Pressure and temperature effects on stoichiometry and microstructure of nitrogen-rich tin thin films synthesized via reactive magnetron dc-sputtering. Journal of Nanomaterials, 2008. ⇒11810.1155/2008/267161]Search in Google Scholar
[[48] L.-M. Popescu. A computer code package for Monte Carlo photon-electron transport simulation: Comparisons with experimental benchmarks. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 161 (2000) 318–322. ⇒11710.1016/S0168-583X(99)00984-2]Search in Google Scholar
[[49] I.-A. Porokhova, Y.-B. Golubovskii, J. Bretagne, M. Tichy, J.-F. Behnke. Kinetic simulation model of magnetron discharges. Physical Review E, 63, 5 (2001) 056408. ⇒116]Search in Google Scholar
[[50] I.A. Porokhova, Y.-B. Golubovskii, J.-F. Behnke. Anisotropy of the electron component in a cylindrical magnetron discharge. i. theory of the multiterm analysis. Physical Review E, 71, 6 (2005) 066406. ⇒116]Search in Google Scholar
[[51] I.-A. Porokhova, Y.-B. Golubovskii, J.-F. Behnke. Anisotropy of the electron component in a cylindrical magnetron discharge. ii. application to real magnetron discharge. Physical review E, 71, 6 (2005) 066407. ⇒11610.1103/PhysRevE.71.06640716089880]Search in Google Scholar
[[52] R.-K. Porteous, D.-B. Graves. Modeling and simulation of magnetically confined low-pressure plasmas in two dimensions. IEEE transactions on plasma science, 19, 2 (1991) 204–213. ⇒11610.1109/27.106815]Search in Google Scholar
[[53] T.-E. Sheridan, M.-J. Goeckner, J. Goree. Model of energetic electron transport in magnetron discharges. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 8, 1 (1990) 30–37. ⇒11610.1116/1.577093]Search in Google Scholar
[[54] F. Shinoki, A. Itoh. Mechanism of rf reactive sputtering. Journal of Applied Physics, 46, 8 (1975) 3381–3384. ⇒12010.1063/1.322242]Search in Google Scholar
[[55] W.-D. Sproul, D.-J. Christie, D.-C. Carter. Control of reactive sputtering processes. Thin solid films, 491, 1-2 (2005) 1–17. ⇒12510.1016/j.tsf.2005.05.022]Search in Google Scholar
[[56] K. Strijckmans, W.-P. Leroy, R. De Gryse, D. Depla. Modeling reactive magnetron sputtering: Fixing the parameter set. Surface and Coatings Technology, 206, 17 (2012) 3666–3675. ⇒117, 12410.1016/j.surfcoat.2012.03.019]Search in Google Scholar
[[57] K. Strijckmans and D. Depla. A time-dependent model for reactive sputter deposition. Journal of Physics D: Applied Physics, 37, 23 (2014) 235302. ⇒117, 127]Search in Google Scholar
[[58] K. Strijckmans. Modeling the reactive magnetron sputtering process. PhD Thesis, Ghent University, 2015. ⇒114, 123, 125, 126]Search in Google Scholar
[[59] R. Terry, K. Gibbons, S. Zarrabian. Method and apparatus for reactive sputtering employing two control loops, August 22 2000. US Patent 6,106,676. ⇒127]Search in Google Scholar
[[60] A.-E. Wendt, M.-A. Lieberman, H. Meuth. Radial current distribution at a plan ar magnetron cathode. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 6, 3 (1988) 1827–1831. ⇒11610.1116/1.575263]Search in Google Scholar
[[61] A.-E. Wendt, M.-A. Lieberman. Spatial structure of a planar magnetron discharge. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 8, 2 (1990) 902–907. ⇒11610.1116/1.576894]Search in Google Scholar
[[62] C. Woelfel, P. Awakowicz, J. Lunze. Model reduction and identification of nonlinear reactive sputter processes. IFAC-PapersOnLine, 50, 1 (2017) 13728–13734. ⇒115, 127, 128, 12910.1016/j.ifacol.2017.08.2553]Search in Google Scholar
[[63] C. Woelfel, P. Awakowicz, J. Lunze. Robust high-gain control of nonlinear reactive sputter processes. In 2017 IEEE Conference on Control Technology and Applications (CCTA), IEEE, 2017, pp 25–30. ⇒12810.1109/CCTA.2017.8062435]Search in Google Scholar
[[64] C. Woelfel, P. Awakowicz, J. Lunze. Tuning rule for linear control of nonlinear reactive sputter processes. In 2017 21st International Conference on Process Control (PC), IEEE, 2017, pp. 109–114. ⇒12810.1109/PC.2017.7976198]Search in Google Scholar
[[65] C. Woelfel, S. Kockmann, P. Awakowicz, J. Lunze. Model identification of nonlinear sputter processes. In 2017 17th International Conference on Control, Automation and Systems (ICCAS), IEEE, 2017, pp. 182–187. ⇒12810.23919/ICCAS.2017.8204438]Search in Google Scholar
[[66] C. Woelfel, S. Kockmann, P. Awakowicz, J. Lunze. Neural network based linearization and control of sputter processes. In 2017 11th Asian Control Conference (ASCC), IEEE, 2017, pp. 2831–2836. ⇒12810.1109/ASCC.2017.8287626]Search in Google Scholar
[[67] C. Woelfel, D. Bockhorn, P. Awakowicz, J. Lunze. Model approximation and stabilization of reactive sputter processes. Journal of Process Control, 2018. ⇒128, 13110.1016/j.jprocont.2018.06.009]Search in Google Scholar
[[68] Y. Yamamura and M. Ishida. Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 13, 1 (1995) 101–112. ⇒11710.1116/1.579874]Search in Google Scholar