Silicon carbonitride layers deposited on titanium and polyurethane by PACVD method

This work reports the results concerning formation and tribological properties of SiCxNy(H) layers deposited on Ti Grade 2 and polyurethane foil. Depending on the substrate, two variants of PACVD were used. The SiCxNy(H) layers on titanium were deposited with application of MWCVD (2.45 GHz, 2 kW). The layers on polyurethane were deposited using RFCVD (13.56 MHz, 400 W). Good adhesion between the SiCxNy(H) layers and polymeric foil was achieved by formation of a transitional C:N:H layer and incorporating Si gradient into the structure of the SiCxNy(H) layer. The chemical composition of the layers was tailored by precise control of the gaseous precursors ratios: [SiH4]/[NH3], [SIH4]/[NH3]/[CH4], [SiH4]/[CH4] or [SiH4]/[N2]/[CH4]. The structure and chemical composition of the obtained layers were subjected to further studies (FTIR, SEM/EDS). The roughness, friction coefficient and wear resistance were also measured. The results show that SiCxNy(H) layers offer attractive tribological properties which make them good candidates for various applications, including biomedical devices.