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Materials Science-Poland
Volume 31 (2013): Numero 1 (January 2013)
Accesso libero
Structural and surface properties of TiO2 thin films doped with neodymium deposited by reactive magnetron sputtering
Michał Mazur
Michał Mazur
,
Danuta Kaczmarek
Danuta Kaczmarek
,
Jarosław Domaradzki
Jarosław Domaradzki
,
Damian Wojcieszak
Damian Wojcieszak
,
Piotr Mazur
Piotr Mazur
e
Eugeniusz Prociow
Eugeniusz Prociow
| 09 feb 2013
Materials Science-Poland
Volume 31 (2013): Numero 1 (January 2013)
INFORMAZIONI SU QUESTO ARTICOLO
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CONDIVIDI
Pubblicato online:
09 feb 2013
Pagine:
71 - 79
DOI:
https://doi.org/10.2478/s13536-012-0066-4
Parole chiave
TiO2
,
neodymium
,
physicochemical properties
,
magnetron sputtering
© 2013 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Michał Mazur
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
Danuta Kaczmarek
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
Jarosław Domaradzki
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
Damian Wojcieszak
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland
Piotr Mazur
Institute of Experimental Physics, Wrocław University, pl. Maksa Borna 9, 50-204, Wrocław, Poland
Eugeniusz Prociow
Faculty of Microsystem Electronics and Photonics, Wrocław University of Technology, Janiszewskiego 11/17, 50-372, Wrocław, Poland