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The Influence of Technological PVD Process Parameters on the Topography, Crystal and Molecular Structure of Nanocomposite Films Containing Palladium Nanograins

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Joanna Rymarczyk
Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland
Elżbieta Czerwosz
Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland
Mirosław Kozłowski
Tele and Radio Research Institute, Ratuszowa 11, 03-450 Warsaw, Poland
Piotr Dłużewski
Institute of Physics PAS, al. Lotników 32/46, 02-668 Warsaw, Poland
Wojciech Kowalski
Institute of Physics PAS, al. Lotników 32/46, 02-668 Warsaw, Poland
eISSN:
1899-4741
Lingua:
Inglese
Frequenza di pubblicazione:
4 volte all'anno
Argomenti della rivista:
Industrial Chemistry, Biotechnology, Chemical Engineering, Process Engineering