<abstract xml:lang="en" xmlns="http://www.w3.org/1999/xhtml"><p>Carbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures synthesis including arc discharges, laser ablation and chemical vapour deposition. Plasma enhanced chemical vapour deposition (PECVD) with its application in modern microelectronics industry became soon target of research in carbon nanostructures synthesis. Selection of the ideal growth process depends on the application. Most of PECVD techniques work at low pressure requiring vacuum systems. However for industrial applications it would be desirable to work at atmospheric pressure. In this article carbon nanostructures synthesis by plasma discharges working at atmospheric pressure will be reviewed.</p></abstract>

Carbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures synthesis including arc discharges, laser ablation and chemical vapour deposition. Plasma enhanced chemical vapour deposition (PECVD) with its application in modern microelectronics industry became soon target of research in carbon nanostructures synthesis. Selection of the ideal growth process depends on the application. Most of PECVD techniques work at low pressure requiring vacuum systems. However for industrial applications it would be desirable to work at atmospheric pressure. In this article carbon nanostructures synthesis by plasma discharges working at atmospheric pressure will be reviewed.

Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure

Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlářská 2, 611 37, Brno, Czech Republic

Journal of Electrical Engineering

Carbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures...

Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure

Publié en ligne: 07 juin 2011

Pages: 311 - 313

DOI: https://doi.org/10.2478/v10187-011-0049-9

Mots clés
carbon nanostructures, plasma enhanced chemical vapour deposition, atmospheric pressure

This content is open access.

Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric Pressure

Publié en ligne: 07 juin 2011

Pages: 311 - 313

DOI: https://doi.org/10.2478/v10187-011-0049-9

Mots cléscarbon nanostructures, plasma enhanced chemical vapour deposition, atmospheric pressure

This content is open access.

Mots clés
carbon nanostructures, plasma enhanced chemical vapour deposition, atmospheric pressure