<abstract xmlns="http://www.w3.org/1999/xhtml">

A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in reflectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2. The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance.
</abstract>

A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous crosslinking framework, was fabricated with a designed volume ratio mixture both with colloidal silica suspension and soluble organic polysiloxane. The upper layer for the bilayer film was a hexamethylisilazane (HMDS) modified colloidal silica suspension, leading to the film surface transfer to hydrophobic. The strategic design of nanostructures in the bottom and upper layers resulted in a refractive-index gradient SiO2 film with enhanced AR properties. The bilayer film demonstrated a transmittance of 99.5% at 1064 nm, accompanied by a notable reduction in reflectivity. Moreover, the laser-induced damage threshold of the bilayer film was increased by 30%, rising to as high as 24.7 J/cm2. The SiO2 nanostructured film both showed a refractive-index gradient structure with excellent AR properties and exhibited good laser damage resistance.

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm

Joint Laboratory for Extreme Conditions Matter Properties, School of Mathematics and Physics

Southwest University of Science and Technology

Department of Nanomaterials Physicochemistry, Faculty of Chemical Technology and Engineering

Key Laboratory of Icing and Anti/De-icing

Polish Journal of Chemical Technology

This work is licensed under the Creative Commons Attribution 4.0 International License.

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO nanostructured films at 1064 nm

A facile sol-gel procedure was employed to create refractive-index gradient SiO2 antireflective (AR) films. A monolayer film, characterized by the porous...

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO₂ nanostructured films at 1064 nm

Publicado en línea: 12 jul 2024

Páginas: 25 - 30

DOI: https://doi.org/10.2478/pjct-2024-0014

Palabras clave
SiO nanostructured films, Sol-gel procedure, Refractive-index gradient, Antireflective, Laser damage resistance

© 2024 Lili Wan et al., published by Sciendo

This work is licensed under the Creative Commons Attribution 4.0 International License.

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO2 nanostructured films at 1064 nm

Publicado en línea: 12 jul 2024

Páginas: 25 - 30

DOI: https://doi.org/10.2478/pjct-2024-0014

Palabras claveSiO nanostructured films, Sol-gel procedure, Refractive-index gradient, Antireflective, Laser damage resistance

© 2024 Lili Wan et al., published by Sciendo

This work is licensed under the Creative Commons Attribution 4.0 International License.

Enhanced antireflective and laser damage resistance of refractive-index gradient SiO₂ nanostructured films at 1064 nm

Palabras clave
SiO nanostructured films, Sol-gel procedure, Refractive-index gradient, Antireflective, Laser damage resistance