<abstract xmlns="http://www.w3.org/1999/xhtml">In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO2) thin films deposited by continuous and sequential magnetron sputtering processes were presented. In case of continuous process, magnetron was continuously supplied with voltage for 90 min. In turn, in sequential process, the voltage was supplied for 1 s alternately with 1 s break, therefore, the total time of the process was extended to 180 min. The TiO2 thin films were crack free, exhibited good adherence to the substrate and the surface morphology was homogeneous. Structural analysis showed that there were no major differences in the microstructure between coatings deposited in continuous and sequential processes. Both films exhibited nanocrystalline anatase structure with crystallite sizes of ca. 21 nm. Deposited coatings had high transparency in the visible wavelength range. Significant differences were observed in porosity (lower for sequential process), scratch resistance (better for sequential process), mechanical performance, i.e. hardness:elastic modulus ratio (higher for sequential process) and corrosion resistance (better for sequential process).</abstract>

In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO2) thin films deposited by continuous and sequential magnetron sputtering processes were presented. In case of continuous process, magnetron was continuously supplied with voltage for 90 min. In turn, in sequential process, the voltage was supplied for 1 s alternately with 1 s break, therefore, the total time of the process was extended to 180 min. The TiO2 thin films were crack free, exhibited good adherence to the substrate and the surface morphology was homogeneous. Structural analysis showed that there were no major differences in the microstructure between coatings deposited in continuous and sequential processes. Both films exhibited nanocrystalline anatase structure with crystallite sizes of ca. 21 nm. Deposited coatings had high transparency in the visible wavelength range. Significant differences were observed in porosity (lower for sequential process), scratch resistance (better for sequential process), mechanical performance, i.e. hardness:elastic modulus ratio (higher for sequential process) and corrosion resistance (better for sequential process).

Influence of magnetron powering mode on various properties of TiO2 thin films

Wroclaw University of Science and Technology

Faculty of Microsystem Electronics and Photonics

Motor Transport Institute, Centre for Material Testing

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Influence of magnetron powering mode on various properties of TiO thin films

In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO2) thin films deposited by...

Influence of magnetron powering mode on various properties of TiO₂ thin films

Publicado en línea: 01 feb 2019

Páginas: 748 - 760

Recibido: 08 nov 2018

Aceptado: 24 nov 2018

DOI: https://doi.org/10.2478/msp-2018-0099

Palabras clave
titanium alloys, TiO, sputtering, mechanical properties, structural properties, thin films

© 2018 Artur Wiatrowski et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Influence of magnetron powering mode on various properties of TiO2 thin films

Publicado en línea: 01 feb 2019

Páginas: 748 - 760

Recibido: 08 nov 2018

Aceptado: 24 nov 2018

DOI: https://doi.org/10.2478/msp-2018-0099

Palabras clavetitanium alloys, TiO, sputtering, mechanical properties, structural properties, thin films

© 2018 Artur Wiatrowski et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Influence of magnetron powering mode on various properties of TiO₂ thin films

Palabras clave
titanium alloys, TiO, sputtering, mechanical properties, structural properties, thin films