<abstract xmlns="http://www.w3.org/1999/xhtml"><p>The paper describes the development and production of a nano-optical device consisting of a nano-perforated layer of silicon nitride stretched in a single-crystal silicon frame using electron beam lithography (EBL) and reactive ion etching (RIE) techniques. Procedures for transferring nanostructures to the nitride layer are described, starting with the preparation of a metallic mask layer by physical vapor deposition (PVD), high-resolution pattern recording technique using EBL and the transfer of the motif into the functional layer using the RIE technique. Theoretical aspects are summarized including technological issues, achieved results and application potential of patterned silicon nitride membranes.</p></abstract>

The paper describes the development and production of a nano-optical device consisting of a nano-perforated layer of silicon nitride stretched in a single-crystal silicon frame using electron beam lithography (EBL) and reactive ion etching (RIE) techniques. Procedures for transferring nanostructures to the nitride layer are described, starting with the preparation of a metallic mask layer by physical vapor deposition (PVD), high-resolution pattern recording technique using EBL and the transfer of the motif into the functional layer using the RIE technique. Theoretical aspects are summarized including technological issues, achieved results and application potential of patterned silicon nitride membranes.

Functional nano-structuring of thin silicon nitride membranes

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

{"article-title":"Functional nano-structuring of thin silicon nitride membranes"}

The paper describes the development and production of a nano-optical device consisting of a nano-perforated layer of silicon nitride stretched in a...

Functional nano-structuring of thin silicon nitride membranes

Publicado en línea: 13 may 2020

Páginas: 127 - 130

Recibido: 19 dic 2019

DOI: https://doi.org/10.2478/jee-2020-0019

Palabras clave
membrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication

© 2020 Milan Matějka et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Functional nano-structuring of thin silicon nitride membranes

Publicado en línea: 13 may 2020

Páginas: 127 - 130

Recibido: 19 dic 2019

DOI: https://doi.org/10.2478/jee-2020-0019

Palabras clavemembrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication

© 2020 Milan Matějka et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Palabras clave
membrane, nano optical device, electron optics, electron beam lithography, silicon nitride, reactive ion etching, silicon etching, microfabrication