Acceso abierto

Characterization of Anodized Aluminum Alloy Al6061-T6 Under Simulated Leo Plasma Conditions

, , ,  y   
30 jun 2025

Cite
Descargar portada

Figure 1.

Testing of aluminum alloy samples Al6061-T6
Testing of aluminum alloy samples Al6061-T6

Figure 2.

CRYO vacuum chamber and plasma generation principle
CRYO vacuum chamber and plasma generation principle

Figure 3.

Langmuir probe and samples inside the chamber
Langmuir probe and samples inside the chamber

Figure 4.

The behavior of arc current in samples subjected to a 1-h biasing voltage
The behavior of arc current in samples subjected to a 1-h biasing voltage

Figure 5.

Behavior of the potential waveform in samples subjected to a biasing voltage for 1 h
Behavior of the potential waveform in samples subjected to a biasing voltage for 1 h

Figure 6.

Arc current behavior in samples subjected to a 2-h biasing voltage
Arc current behavior in samples subjected to a 2-h biasing voltage

Figure 7.

The behavior of the potential waveform in samples exposed to a biasing voltage for 2 h
The behavior of the potential waveform in samples exposed to a biasing voltage for 2 h

Figure 8.

UV/Vis absorption spectra for a sample with a coating thickness of 25 μm
UV/Vis absorption spectra for a sample with a coating thickness of 25 μm

Figure 9.

UV/Vis absorption spectra for a sample with a coating thickness of 45 μm
UV/Vis absorption spectra for a sample with a coating thickness of 45 μm

Figure 10.

Reflectance of the 25-μm-thick sample
Reflectance of the 25-μm-thick sample

Figure 11.

Reflectance of the 25-μm-thick sample
Reflectance of the 25-μm-thick sample

Figure 12.

Peak values for the two samples at various times of plasma exposure in the absorption case
Peak values for the two samples at various times of plasma exposure in the absorption case

Figure 13.

Peak values for the two samples at various plasma exposure times in the reflectance case
Peak values for the two samples at various plasma exposure times in the reflectance case

Figure 14.

EDX analysis of the 45-μm-thick sample before plasma exposure
EDX analysis of the 45-μm-thick sample before plasma exposure

Figure 15.

EDX analysis of the 45-μm-thick sample after 1 h of plasma exposure
EDX analysis of the 45-μm-thick sample after 1 h of plasma exposure

Figure 16.

EDX analysis of the 45-μm-thick sample after 2 h of plasma exposure
EDX analysis of the 45-μm-thick sample after 2 h of plasma exposure

Quantitative analysis of the sample after 1 h of plasma exposure

Element Weight ℅ Atomic %
CK 13.23 16.28
OK 42.63 46.06
Al K 39.39 36.16
Si K 0.33 0.15
S K 4.42 1.35
Total 100 100

Calculated values of the plasma parameters

Parameters Calculated values
Floating potential 7.5 V
Electron saturation current 19 × 10−5A
Electron temperature (Te) 3 eV
Electron density (ne) 4.47 × 106/cm3
Debye length λD λD (cm) ≈ 0.61 (cm)

Maximum absorbance and reflectance values for the two samples

Condition 45 μm 25 μm
Abs (max) Ref (max) Abs (max) Ref (max)
Without the plasma effect 1.18935 50.4173 1.451 66.9496
Plasma exposure (1 h) 1.4533 51.9398 1.532 67.1468
Plasma exposure (2 h) 1.35128 51.962 1.486 71.105

Quantitative analysis of the sample with 2 h of plasma exposure

Element Weight ℅ Atomic %
CK 12.86 15.81
OK 40.79 44.09
Al K 41.63 38.57
Si K 0.48 0.22
S K 4.24 1.31
Total 100 100

Quantitative analysis of the sample excluding plasma effects

Element Weight ℅ Atomic %
CK 16.73 19.98
OK 45.72 50.16
Al K 32.27 27.78
Si K 0.51 0.23
S K 4.77 1.85
Total 100 100

Average surface roughness values for the two samples

Condition Surface roughness (μm)
Sample with a thickness of 45 μm Sample with a thickness of 25 μm
Without plasma effect 1.8178 1.831
With plasma exposure (2 h) 1.2291 1.5157
Idioma:
Inglés
Calendario de la edición:
4 veces al año
Temas de la revista:
Geociencias, Geociencias, otros