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Morphology and photoresponse of crystalline antimony film grown on mica by physical vapor deposition

Muhammad Shafa

Muhammad Shafa

Institute of Fundamental and Frontier Sciences, University of Electronics Science and Technology of ChinaChengdu, China
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Shafa, Muhammad
, 
Zhiming Wang

Zhiming Wang

  • Institute of Fundamental and Frontier Sciences, University of Electronics Science and Technology of ChinaChengdu, China
  • State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of ChinaChengdu, PR China
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Wang, Zhiming
, 
Muhammad Yasin Naz

Muhammad Yasin Naz

  • Department of Mechanical Engineering, Universiti Teknologi PETRONASTronoh, Malaysia
  • Department of Physics, University of AgricultureFaisalabad, Pakistan
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Naz, Muhammad Yasin
, 
Sadaf Akbar

Sadaf Akbar

Zernike Institute for Advanced Materials, University of GroningenGroningen, The Netherlands
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Akbar, Sadaf
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Muhammad Umar Farooq

Muhammad Umar Farooq

Institute of Fundamental and Frontier Sciences, University of Electronics Science and Technology of ChinaChengdu, China
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Farooq, Muhammad Umar
 y 
Abdul Ghaffar

Abdul Ghaffar

Department of Physics, University of AgricultureFaisalabad, Pakistan
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Ghaffar, Abdul
  
12 sept 2016
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Categoría del artículo: Research Article
Publicado en línea: 12 sept 2016
Páginas: 591 - 596
Recibido: 01 dic 2016
Aceptado: 03 jul 2016
DOI: https://doi.org/10.1515/msp-2016-0084
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© 2016 Muhammad Shafa et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Fig. 1

Illustration of the basic nucleation modes.
Illustration of the basic nucleation modes.

Fig. 2

(a) Schematic of the physical vapor deposition reactor, (b) temperature gradient measured inside the furnace tube.
(a) Schematic of the physical vapor deposition reactor, (b) temperature gradient measured inside the furnace tube.

Fig. 3

XRD patterns of antimony coated and uncoated mica.
XRD patterns of antimony coated and uncoated mica.

Fig. 4

SEM micrographs of the antimony thin film grown on a mica sheet.
SEM micrographs of the antimony thin film grown on a mica sheet.

Fig. 5

Pre-annealing EDX and SEM of antimony film.
Pre-annealing EDX and SEM of antimony film.

Fig. 6

Post-annealing EDX and SEM of antimony film.
Post-annealing EDX and SEM of antimony film.

Fig. 7

Current density-voltage (j-V) characteristics of antimony thin film under dark and light scenarios.
Current density-voltage (j-V) characteristics of antimony thin film under dark and light scenarios.

Summary of the growth conditions and vapor concentration in furnace tube of PVD reactor (Source temperature 900 °C, growth temperature 441 °C, source before deposition: 0_1044 g, after deposition: 0_000 g)_

Time [min]1581318233346667176818691160
Temp. [°C]300450600770900900900900900900900800700600300
Pressure 0.1 Pa1.41.41.41.41.4 GFC

GFC: Growth Flow Condition

1.41.01.08.68.67.47.47.48.61.4
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Ciencia de los materiales, Ciencia de los materiales, otros, Nanomateriales, Materiales funcionales e inteligentes, Características y propiedades de los materiales
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