<abstract xml:lang="en" xmlns="http://www.w3.org/1999/xhtml"><p>The morphology of nanospheres is crucial for designing the nanofabrication in the nanosphere lithography. Here, by plasma etching, the controllable tailoring of the nanosphere is realized and its morphology dependence on the initial shape, microscopic roughness, and the etching conditions is investigated quantitatively. The results show that the shape evolution strongly depends on the etching gas, power, and process duration. Particularly, the aspect ratio (diameter/height) significantly increases with violent etching, turning the spherical shape into tiny ellipsoidal nanoparticles. The findings are practical to the protocol of non-uniform etching of nanoobjects and provide the useful design tool for the device fabrication at nanoscale.</p></abstract>

The morphology of nanospheres is crucial for designing the nanofabrication in the nanosphere lithography. Here, by plasma etching, the controllable tailoring of the nanosphere is realized and its morphology dependence on the initial shape, microscopic roughness, and the etching conditions is investigated quantitatively. The results show that the shape evolution strongly depends on the etching gas, power, and process duration. Particularly, the aspect ratio (diameter/height) significantly increases with violent etching, turning the spherical shape into tiny ellipsoidal nanoparticles. The findings are practical to the protocol of non-uniform etching of nanoobjects and provide the useful design tool for the device fabrication at nanoscale.

Irregular shaping of polystyrene nanosphere array by plasma etching

Nano Biophotonics Center, National Key Laboratory and Incubation Base of Photoelectric Technology and Functional Materials, Department of Physics, Northwest University, 710069, Xi’an, China

School of Physics, Peking University, Beijing, 100871, China

Northwest Institute for Nonferrous Metal Research (NIN), 710016, Xi’an, China

Institute of Photonics and Photon-Technology, and Provincial Key Laboratory of Photoelectronic Technolony of Northwest University, 710069, Xi’an, China

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

{"article-title":"Irregular shaping of polystyrene nanosphere array by plasma etching"}

The morphology of nanospheres is crucial for designing the nanofabrication in the nanosphere lithography. Here, by plasma etching, the controllable tailoring...

Irregular shaping of polystyrene nanosphere array by plasma etching

Online veröffentlicht: 29. Aug. 2013

Seitenbereich: 331 - 337

DOI: https://doi.org/10.2478/s13536-013-0109-5

Schlüsselwörter
polystyrene, nanosphere array, self-assembly

© 2013 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Irregular shaping of polystyrene nanosphere array by plasma etching

Online veröffentlicht: 29. Aug. 2013

Seitenbereich: 331 - 337

DOI: https://doi.org/10.2478/s13536-013-0109-5

Schlüsselwörterpolystyrene, nanosphere array, self-assembly

© 2013 Wroclaw University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Schlüsselwörter
polystyrene, nanosphere array, self-assembly