<abstract xmlns="http://www.w3.org/1999/xhtml"><p>In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N<sub>2</sub> gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.</p></abstract>

In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical application. Films of ZrN were grown onto 316L stainless steel substrate using radio-frequency (rf) magnetron sputtering from a pure zirconium target in Ar - N2 gas mixture. The substrate bias voltage was varied from 0 to −100 V, which produces a variation in the structural and electrochemical properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, scanning force microscopy and potentiodynamic polarization.

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Centre de Développement des Technologies Avancées (CDTA)

Unité de Recherche Matériaux Procédés et Environnement, Faculté des Sciences de lIngénieur Cité Frantz Fanon

Journal of Electrical Engineering

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

In order to study the influence of the substrate bias on the properties of ZrN thin films deposited by radio-frequency magnetron sputtering for biomedical...

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Online veröffentlicht: 28. Sept. 2019

Seitenbereich: 112 - 116

Eingereicht: 19. März 2019

DOI: https://doi.org/10.2478/jee-2019-0051

Schlüsselwörter
ZrN, 316L stainless steel, RF magnetron sputtering, bias voltage, corrosion

© 2019 Mourad Azibi et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

The influence of substrate bias voltage on the electrochemical properties of ZrN thin films deposited by radio-frequency magnetron sputtering: Biomedical application

Online veröffentlicht: 28. Sept. 2019

Seitenbereich: 112 - 116

Eingereicht: 19. März 2019

DOI: https://doi.org/10.2478/jee-2019-0051

SchlüsselwörterZrN, 316L stainless steel, RF magnetron sputtering, bias voltage, corrosion

© 2019 Mourad Azibi et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Schlüsselwörter
ZrN, 316L stainless steel, RF magnetron sputtering, bias voltage, corrosion