Electron Beam Lithography Double Step Exposure Technique for Fabrication of Mushroom-Like Profile in Bilayer Resist System

Online veröffentlicht: 31. Jan. 2015

Seitenbereich: 381 - 385

Eingereicht: 15. Juni 2014

DOI: https://doi.org/10.2478/jee-2014-0062

Schlüsselwörter

T-shape resist profile, mushroom-like resist profile, bilayer resist system, resist exposure model, MC simulations, e-beam lithography, double step exposure

© 2015 Faculty of Electrical Engineering and Information Technology, Slovak University of Technology

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.