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Thick films of AR Grade nano Fe2O3 material with n-type semiconducting properties were prepared and tested for their gas sensing performances. Thick films of the materials were prepared by screen printing technique. The gas sensing performance was studied using static gas sensing system. The material was tested for various gases such as CO, CO2, NH3, Cl2, H2, LPG, ethanol and H2S. The nano Fe2O3 film showed maximum sensitivity to ethanol gas at 350 °C temperature at 250 ppm concentration with short response time and large recovery time. Physical and structural properties of the film material were studied by SEM, TEM, XRD and UV spectroscopy.
</abstract>

Thick films of AR Grade nano Fe2O3 material with n-type semiconducting properties were prepared and tested for their gas sensing performances. Thick films of the materials were prepared by screen printing technique. The gas sensing performance was studied using static gas sensing system. The material was tested for various gases such as CO, CO2, NH3, Cl2, H2, LPG, ethanol and H2S. The nano Fe2O3 film showed maximum sensitivity to ethanol gas at 350 °C temperature at 250 ppm concentration with short response time and large recovery time. Physical and structural properties of the film material were studied by SEM, TEM, XRD and UV spectroscopy.

Nanostructured Fe2O3 Thick Film as an Ethanol Sensor

International Journal on Smart Sensing and Intelligent Systems

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Nanostructured FeO Thick Film as an Ethanol Sensor

Thick films of AR Grade nano Fe2O3 material with n-type semiconducting properties were prepared and tested for their gas sensing performances. Thick films of...

Nanostructured Fe₂O₃ Thick Film as an Ethanol Sensor

Online veröffentlicht: 01. Juni 2012

Seitenbereich: 441 - 457

Akzeptiert: 09. Mai 2012

DOI: https://doi.org/10.21307/ijssis-2017-489

© 2012 N. K. Pawar et al., published by Sciendo

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.