Effect of electron beam injection on boron redistribution in silicon and oxide layer
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24. Feb. 2017
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Online veröffentlicht: 24. Feb. 2017
Seitenbereich: 14 - 17
Eingereicht: 29. Feb. 2016
Akzeptiert: 15. Jan. 2017
DOI: https://doi.org/10.1515/msp-2017-0027
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© 2017 Shiqiang Qin, Yi Tan, Jiayan Li, Dachuan Jiang, Shutao Wen, Shuang Shi
This article is distributed under the terms of the Creative Commons Attribution Non-Commercial License, which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.
Qin, Shiqiang
School of Materials Science and Engineering, Dalian University of TechnologyDalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning ProvinceDalian, China
Tan, Yi
School of Materials Science and Engineering, Dalian University of TechnologyDalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning ProvinceDalian, China
Li, Jiayan
School of Materials Science and Engineering, Dalian University of TechnologyDalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning ProvinceDalian, China
Jiang, Dachuan
School of Materials Science and Engineering, Dalian University of TechnologyDalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning ProvinceDalian, China
Wen, Shutao
School of Materials Science and Engineering, Dalian University of TechnologyDalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning ProvinceDalian, China
Shi, Shuang
School of Materials Science and Engineering, Dalian University of TechnologyDalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning ProvinceDalian, China