<abstract xmlns="http://www.w3.org/1999/xhtml">Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.</abstract>

Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO2 with rutile structure.

Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland

Centre for Material Testing and Mechatronics, Motor Transport Institute, Jagiellonska 80, 03-301 Warsaw, Poland

Faculty of Mechanical Engineering, University of Technology and Life Sciences in Bydgoszcz, Kaliskiego 7, 85-796 Bydgoszcz, Poland

Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Kaniszewskiego 11/17,50-372 Wroclaw, Poland

Materials Science-Poland

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited...

Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

Online veröffentlicht: 30. Aug. 2016

Seitenbereich: 660 - 668

Eingereicht: 09. März 2015

Akzeptiert: 20. Mai 2015

DOI: https://doi.org/10.1515/msp-2015-0084

Schlüsselwörter
plasma modulated magnetron sputtering, titanium dioxide, hardness, scratch resistance, optical and structural properties

© 2016

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

Online veröffentlicht: 30. Aug. 2016

Seitenbereich: 660 - 668

Eingereicht: 09. März 2015

Akzeptiert: 20. Mai 2015

DOI: https://doi.org/10.1515/msp-2015-0084

Schlüsselwörterplasma modulated magnetron sputtering, titanium dioxide, hardness, scratch resistance, optical and structural properties

© 2016

This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Schlüsselwörter
plasma modulated magnetron sputtering, titanium dioxide, hardness, scratch resistance, optical and structural properties