1. bookVolume 36 (2018): Issue 4 (December 2018)
Journal Details
License
Format
Journal
eISSN
2083-134X
First Published
16 Apr 2011
Publication timeframe
4 times per year
Languages
English
access type Open Access

Influence of magnetron powering mode on various properties of TiO2 thin films

Published Online: 01 Feb 2019
Volume & Issue: Volume 36 (2018) - Issue 4 (December 2018)
Page range: 748 - 760
Received: 08 Nov 2018
Accepted: 24 Nov 2018
Journal Details
License
Format
Journal
eISSN
2083-134X
First Published
16 Apr 2011
Publication timeframe
4 times per year
Languages
English
Abstract

In this paper, comparative studies on the structural, surface, optical, mechanical and corrosion properties of titanium dioxide (TiO2) thin films deposited by continuous and sequential magnetron sputtering processes were presented. In case of continuous process, magnetron was continuously supplied with voltage for 90 min. In turn, in sequential process, the voltage was supplied for 1 s alternately with 1 s break, therefore, the total time of the process was extended to 180 min. The TiO2 thin films were crack free, exhibited good adherence to the substrate and the surface morphology was homogeneous. Structural analysis showed that there were no major differences in the microstructure between coatings deposited in continuous and sequential processes. Both films exhibited nanocrystalline anatase structure with crystallite sizes of ca. 21 nm. Deposited coatings had high transparency in the visible wavelength range. Significant differences were observed in porosity (lower for sequential process), scratch resistance (better for sequential process), mechanical performance, i.e. hardness:elastic modulus ratio (higher for sequential process) and corrosion resistance (better for sequential process).

Keywords

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