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Materials Science-Poland
Volume 36 (2018): Issue 4 (December 2018)
Open Access
Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes
G.W. Strzelecki
G.W. Strzelecki
,
K. Nowakowska-Langier
K. Nowakowska-Langier
,
R. Chodun
R. Chodun
,
S. Okrasa
S. Okrasa
,
B. Wicher
B. Wicher
and
K. Zdunek
K. Zdunek
| Feb 01, 2019
Materials Science-Poland
Volume 36 (2018): Issue 4 (December 2018)
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Published Online:
Feb 01, 2019
Page range:
697 - 703
Received:
Nov 29, 2017
Accepted:
Jul 16, 2018
DOI:
https://doi.org/10.2478/msp-2018-0078
Keywords
pulsed magnetron sputtering
,
pulse plasma
,
modulation frequency
,
metallic films
,
ceramic films
© 2018 G.W. Strzelecki et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.
G.W. Strzelecki
National Centre for Nuclear Research,
Otwock, Poland
K. Nowakowska-Langier
National Centre for Nuclear Research,
Otwock, Poland
R. Chodun
Faculty of Materials Science and Engineering, Warsaw University of Technology
Warsaw, Poland
S. Okrasa
Faculty of Materials Science and Engineering, Warsaw University of Technology
Warsaw, Poland
B. Wicher
Faculty of Materials Science and Engineering, Warsaw University of Technology
Warsaw, Poland
K. Zdunek
Faculty of Materials Science and Engineering, Warsaw University of Technology
Warsaw, Poland