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Journals
International Journal on Smart Sensing and Intelligent Systems
Volume 7 (2014): Issue 5 (January 2014)
Open Access
Annealing Effect on the Structural and Optical properties of SiOx films deposited by HFCVD: Features for its possible use as Optical Sensor
J. A. Luna López
J. A. Luna López
,
A. Benítez Lara
A. Benítez Lara
,
G. García Salgado
G. García Salgado
,
D. Hernández de la Luz
D. Hernández de la Luz
,
M. Pacio
M. Pacio
,
A. Morales Sanchez
A. Morales Sanchez
and
S. A. Perez Garcia
S. A. Perez Garcia
| Feb 15, 2020
International Journal on Smart Sensing and Intelligent Systems
Volume 7 (2014): Issue 5 (January 2014)
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Published Online:
Feb 15, 2020
Page range:
1 - 6
DOI:
https://doi.org/10.21307/ijssis-2019-122
Keywords
SiOx
,
HFCVD
,
photoluminiscence
,
FTIR
,
XPS
,
SEM
,
UV/Vis spectroscopy
© 2019 Authors., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
J. A. Luna López
Science Institute-ICUAP-CIDS-BUAP Puebla
Pue., 72571, México
A. Benítez Lara
Science Institute-ICUAP-CIDS-BUAP Puebla
Pue., 72571, México
G. García Salgado
Science Institute-ICUAP-CIDS-BUAP Puebla
Pue., 72571, México
D. Hernández de la Luz
Science Institute-ICUAP-CIDS-BUAP Puebla
Pue., 72571, México
M. Pacio
Science Institute-ICUAP-CIDS-BUAP Puebla
Pue., 72571, México
A. Morales Sanchez
Centro de Investigación en Materiales Avanzados S. C, CIMAV-Unidad Monterrey-PIIT
Apodaca, Nuevo León, México
S. A. Perez Garcia
Centro de Investigación en Materiales Avanzados S. C, CIMAV-Unidad Monterrey-PIIT
Apodaca, Nuevo León, México