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Materials Science-Poland
Volume 34 (2016): Issue 2 (June 2016)
Open Access
The impact of medium frequency pulsed magnetron discharge power on the single probe Langmuir measurements and resulted plasma parameters
A Wiatrowski
A Wiatrowski
and
W.M Posadowski
W.M Posadowski
| Apr 20, 2016
Materials Science-Poland
Volume 34 (2016): Issue 2 (June 2016)
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Article Category:
Research Article
Published Online:
Apr 20, 2016
Page range:
374 - 385
Received:
Oct 13, 2015
Accepted:
Nov 22, 2015
DOI:
https://doi.org/10.1515/msp-2016-0012
Keywords
titanium
,
copper
,
magnetron sputtering
,
pulsed magnetron sputtering
,
medium frequency pulsed magnetron sputtering
,
Langmuir probe measurements
,
Dora Power Systems
© 2016 Wroclaw University of Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
Fig. 1
The WMK-50 magnetron source current and voltage waveforms while driven by the MSS-14 power supply. The voltage waveforms show the difference in the discharge voltage pulses caused by different values of the target material ISEE (Ion induced Secondary Electron Emission) coefficient.
Fig. 2
Waveforms of the MSS-14 power supply output current pulses while driving the WMK-50 magnetron equipped with titanium target. The time point of zero indicates the trigger moment of the oscilloscope time base.
Fig. 3
Details of the Langmuir probe measurements arrangement indicating two chosen spatial positions.
Fig. 4
The electron current curves calculated from Langmuir probe I-V characteristics measured at position No. 1 for (a) titanium and (b) copper sputtering processes, at discharge power of 1; 3; 5 kW.
Fig. 5
The electron current curves calculated from Langmuir probe I-V characteristics measured at position No. 2 for (a) titanium and (b) copper sputtering processes, at discharge power of 1; 3; 5 kW.
Fig. 6
The electron current ratios calculated in electron saturation regions of probe I-V characteristics for (a) titanium and (b) copper sputtering processes.
Fig. 7
Langmuir probe current waveforms recorded during titanium sputtering at +10 V of probe voltage.
Fig. 8
The curves of probe electron current for (a) copper and (b) titanium sputtering processes at position 1, calculated with different value pairs of discharge power (PE1:PE2).