Functional nano-structuring of thin silicon nitride membranes

[1] E. F. Krimmel, R. Hezel, U. Nohl and R. Bohrer, “Silicon Nitride Integrated Circuit (IC) Technology”, Pebler A., Schröder F.Si Silicon.Si.Silicium.Silicon (System-Nr.15), vol S-i/B/1-5/5/c. Springer, pp. 221-222, 1991.10.1007/978-3-662-09901-8_17Search in Google Scholar

[2] W. Eaton, and J. Smith, “Micromachined pressure sensors: review and recent developments”Smart Materials and Structures, vol. 6, no.5, pp. 530-539, 1997.10.1088/0964-1726/6/5/004Search in Google Scholar

[3] G. Rius, A. Baldi, B. Ziaie, M. Z. Atashbar, Introduction to Micro-/Nanofabrication, B. Bhushan (ed) Springer Handbook of Nanotechnology, Springer, ISBN 978-3-662-54355-9, pp. 231-269, 2017.Search in Google Scholar

[4] S. Franssila, Introduction to microfabrication, second edition, Chichester, West Sussex, UK John Wiley & Sons, ISBN 0-470-85105-8, pp. 206-216, 2010.Search in Google Scholar

[5] T. Reisinger, S. Eder, M. Greve, H. Smith, and B. Holst, “Free-standing silicon-nitride zoneplates for neutral-helium microscopy”, Microelectronic Engineering, vol. 87, no.5-8, pp. 1011-1014, 2010.Search in Google Scholar

[6] J. Verbeeck, H. Tian, and A. Béché, “A new way of producing electron vortex probes for STEM”, Ultramicroscopy, vol. 113, pp. 83-87, 2012.10.1016/j.ultramic.2011.10.008Search in Google Scholar

[7] E. Anderson, W. Chao, E. Gullikson, S. Rekawa, N. Andresen, and P. Naulleau, “Silicon nitride zoneplates and packaging for EUV instruments”, J. Vac. Sci. Technol. B, vol. 31, no.6, pp 06F606, 2013.10.1116/1.4826695Search in Google Scholar

[8] T. Niemi, J. Laukkanen, M. Karjalainen and M.Pessa, “Largearea nanoperforated SiN membranes for optical and mechanical filtering”, Microelectronic Engineering, vol. 87, no.5-8, pp. 1620-1622, 2010.Search in Google Scholar

[9] D. Lee, H. Song, K. Chung, M, Jung, H and Yoon, “Microfabrication of SiN Membrane Nanosieve Using Anisotropic Reactive Ion Etching (ARIE) with an Ar/CF4 Gas Flow”, J. Nanosci. Nanotechnol. vol. 11, no. 5 pp. 4511-4516, 2011.Search in Google Scholar

[10] M. Matějka, S. Krátký, T. Řiháček, V. Kolařík, J. Chlumská and M. Urbánek, “Nanopatterning of silicon nitride membranes”, In: NANOCON 2016: 8th International Conference Proceedings, Ostrava: Tanger, ISBN 978-80-87294-68-0, pp. 709-714, 2016.Search in Google Scholar

[11] S. Krátký, V. Kolařík, M. Matějka, M. Urbánek, M. Horáček and J. Chlumská, “Comparison of Ultimate Resolution Achieved by E-Beam Writers with Gaussian Beam”, NANOCON 2013: 5th International Conference Proceedings, Ostrava TANGER, pp. 392-398, 2013.Search in Google Scholar

[12] B. McMorran, J. Perreault, T. Savas, and A. Cronin, “Diffraction of 0. 5 keV electrons from free-standing transmission gratings”, Ultramicroscopy, vol. 106, no 4-5, pp. 356-364, 2006.10.1016/j.ultramic.2005.11.00316386372Search in Google Scholar

[13] T. Řiháček, F. Mika, M. Matějka and S. Krátký, Müllerová, “Study of the coherence of the primary beam the low energy scanning electron microscope”, MC 2015 Microscopy Conference Proceedings, Göttingen DGE, pp. 611-612, 2015.Search in Google Scholar

[14] T. Řiháček, F. Mika, M. Matějka and S. Krátký, Müllerová, “Diffraction in a scanning electron”, 16th Recent Trends in Charged Particle Optics and Surface Physics Instrumentation Conference Proceedings, Skalský Dvůr, pp. 56-57, 2016.Search in Google Scholar