1. bookVolume 71 (2020): Issue 2 (April 2020)
Journal Details
License
Format
Journal
eISSN
1339-309X
First Published
07 Jun 2011
Publication timeframe
6 times per year
Languages
English
access type Open Access

Functional nano-structuring of thin silicon nitride membranes

Published Online: 13 May 2020
Volume & Issue: Volume 71 (2020) - Issue 2 (April 2020)
Page range: 127 - 130
Received: 19 Dec 2019
Journal Details
License
Format
Journal
eISSN
1339-309X
First Published
07 Jun 2011
Publication timeframe
6 times per year
Languages
English
Abstract

The paper describes the development and production of a nano-optical device consisting of a nano-perforated layer of silicon nitride stretched in a single-crystal silicon frame using electron beam lithography (EBL) and reactive ion etching (RIE) techniques. Procedures for transferring nanostructures to the nitride layer are described, starting with the preparation of a metallic mask layer by physical vapor deposition (PVD), high-resolution pattern recording technique using EBL and the transfer of the motif into the functional layer using the RIE technique. Theoretical aspects are summarized including technological issues, achieved results and application potential of patterned silicon nitride membranes.

Keywords

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