1. bookVolume 14 (2014): Issue 1 (February 2014)
Journal Details
License
Format
Journal
eISSN
1335-8871
First Published
07 Mar 2008
Publication timeframe
6 times per year
Languages
English
access type Open Access

Interferometer -based Technology for Optical Nanoscale Inspection

Published Online: 06 Mar 2014
Volume & Issue: Volume 14 (2014) - Issue 1 (February 2014)
Page range: 25 - 28
Journal Details
License
Format
Journal
eISSN
1335-8871
First Published
07 Mar 2008
Publication timeframe
6 times per year
Languages
English
Abstract

We demonstrate the interferometer-based approach for nanoscale grating Critical Dimension (CD) measurements and prove the possibility to achieve no worse than 10 nm accuracy of measurements for 100 nm pitch gratings. The approach is based on phase shift measurement of light fields specularly reflected from periodical pattern and adjacent substrate with subsequent comparison between experimental and simulation results. RCWA algorithm is used to fit the measured results and extract the CD value. It is shown that accuracy of CD value measurement depends rather on the grating’s CD/pitch ratio than its CD value

Keywords

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