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SiN/SiO2 passivation stack of n-type silicon surface

A. El Amrani

A. El Amrani

Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
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El Amrani, A.
, 
R. Si-Kaddour

R. Si-Kaddour

Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
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Si-Kaddour, R.
, 
M. Maoudj

M. Maoudj

Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
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Maoudj, M.
 and 
C. Nasraoui

C. Nasraoui

Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
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Nasraoui, C.
  
Oct 18, 2019
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Published Online: Oct 18, 2019
Page range: 482 - 487
Received: Oct 28, 2018
Accepted: Apr 23, 2019
DOI: https://doi.org/10.2478/msp-2019-0065
Keywords
© 2019 A. El Amrani et al., published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.
El Amrani, A.
Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
Si-Kaddour, R.
Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
Maoudj, M.
Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
Nasraoui, C.
Research Center in Semiconductor Technology for EnergeticAlgiers, Algeria
Language:
English
Publication timeframe:
4 times per year
Journal Subjects:
Materials Sciences, Materials Sciences, other, Nanomaterials, Functional and Smart Materials, Materials Characterization and Properties
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